Materials Communications
Monocrystal elastic constants of orthotropic Y1Ba2Cu3O7: An estimate
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- 31 January 2011, pp. 2253-2255
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Defect theory applied to YBa2Cu3O7−δ
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- 31 January 2011, pp. 2256-2258
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Microstructure and microwave properties of YBCO thin films grown on MgO and SrTiO3 by CVD
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- 31 January 2011, pp. 2259-2263
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The atomic structure of growth interfaces in Y–Ba–Cu–O thin films
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- 31 January 2011, pp. 2264-2271
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Influence of silver on critical current of the Y–Ba–Cu–O superconductor
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- 31 January 2011, pp. 2272-2279
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Processing of Bi2.1Sr1.8Ca1.1Cu2O8 source material for float-zone fiber growth
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- 31 January 2011, pp. 2280-2286
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Effect of Ca2CuO3 excess on superconducting properties in the Bi–Pb–Sr–Ca–Cu–O system
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- 31 January 2011, pp. 2287-2290
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On the mechanism of grain-boundary migration in metals: A molecular dynamics study
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- 31 January 2011, pp. 2291-2304
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Magnetic microstructure of nanostructured Fe, studied by small angle neutron scattering
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- 31 January 2011, pp. 2305-2311
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The fracture toughness for first matrix cracking of a unidirectionally reinforced carbon/carbon composite material
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- 31 January 2011, pp. 2312-2317
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Selective epitaxial growth of silicon
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- 31 January 2011, pp. 2318-2323
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High-resolution electron microscopy of diamond hexagonal silicon in low pressure chemical vapor deposited polycrystalline silicon
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- 31 January 2011, pp. 2324-2336
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Constitutive modeling of the effects of oxygen on the deformation behavior of silicon
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- 31 January 2011, pp. 2337-2352
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Boron and antimony codiffusion in silicon
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- 31 January 2011, pp. 2353-2361
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Thin silicon dioxide and nitrided oxide using rapid thermal processing for trench capacitors
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- 31 January 2011, pp. 2362-2370
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Application of the bond valence method to Si/NiSi2 interfaces
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- 31 January 2011, pp. 2371-2374
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Co-implantation of Mo+ and S+ in SiO2
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- 31 January 2011, pp. 2375-2380
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Thermochemistry in the system Cu–In–S at 298 K
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- 31 January 2011, pp. 2381-2386
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Highly oriented thin films of cubic zirconia on sapphire through grain growth seeding
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- 31 January 2011, pp. 2387-2392
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Chemical vapor deposition of boron nitride using premixed borontrichloride and ammonia
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- 31 January 2011, pp. 2393-2396
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