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Indentation plastic displacement field: Part I. The case of soft films on hard substrates
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- 31 January 2011, pp. 2196-2203
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Indentation plastic displacement field: Part II. The case of hard films on soft substrates
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- 31 January 2011, pp. 2204-2209
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Hard protective overlayers on viscoelastic-plastic substrates
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- 31 January 2011, pp. 2210-2218
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Initial stages of yield in nanoindentation
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- 31 January 2011, pp. 2219-2227
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Nanoindentation of a 10 nm thick thin film
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- 31 January 2011, pp. 2228-2232
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Nanoindentation and incipient plasticity
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- 31 January 2011, pp. 2233-2250
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A study of the submicron indent-induced plastic deformation
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- 31 January 2011, pp. 2251-2258
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Deconvolution of hardness from data obtained from nanoindentation of rough surfaces
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- 31 January 2011, pp. 2259-2268
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Energy considerations regarding yield points during indentation
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- 31 January 2011, pp. 2269-2275
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Compensating for elastic deformation of the indenter in hardness tests of very hard materials
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- 31 January 2011, pp. 2276-2282
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Using the P-δ2 analysis to deconvolute the nanoindentation response of hard-coated systems
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- 31 January 2011, pp. 2283-2295
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A critical examination of the fundamental relations used in the analysis of nanoindentation data
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- 31 January 2011, pp. 2296-2305
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Substrate composition effects on the interfacial fracture of tantalum nitride films
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- 31 January 2011, pp. 2306-2313
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Accurate determination of the mechanical properties of thin aluminum films deposited on sapphire flats using nanoindentations
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- 31 January 2011, pp. 2314-2327
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Micro/nanomechanical and tribological characterization of ultrathin amorphous carbon coatings
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- 31 January 2011, pp. 2328-2337
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Ultra-micro-indentation of silicon and compound semiconductors with spherical indenters
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- 31 January 2011, pp. 2338-2343
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Nanoindentation of particulate coatings
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- 31 January 2011, pp. 2344-2350
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Subsolidus phase equilibria in the La2O3–Ga2O3–NiO system
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- 31 January 2011, pp. 2351-2354
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The effect of target crystallography on the growth of Pb(Mg1/3Nb2/3)O3 thin films using pulsed laser deposition
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- 31 January 2011, pp. 2355-2358
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Evidence for continuous areas of crystalline β–C3N4 in sputter-deposited thin films
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- 31 January 2011, pp. 2359-2363
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