Periodically textured back reflectors with hexagonal dimple arrays are applied to thin-film microcrystalline silicon (μc-Si:H) solar cells for enhancing light trapping. The period and aspect ratio of the honeycomb textures have a big impact on the photovoltaic performance. When the textures have a moderate aspect ratio, the optimum period for obtaining a high short circuit current density (JSC) is found to be equal to or slightly larger than the cell thickness. If the cell thickness exceeds the texture period, the cell surface tends to be flattened and texture-induced defects are generated, which constrain the improvement in JSC. Based on these findings, we have fabricated optimized μc-Si:H cells achieving a high active-area efficiency exceeding 11% and a JSC of 30 mA/cm2.

We have fabricated high-efficiency a-Si/µc-Si tandem solar cells and modules with a very high µc-Si deposition rate using Localized Plasma Confinement CVD to give very high-rate deposition (>2.0 nm/s) of device-grade µc-Si layers. For further progress in productive plasma-CVD techniques, we have studied plasma phenomena by combining newly developed plasma simulation and plasma diagnosis techniques that reveal the importance of non-emissive atomic hydrogen. We also have proposed a model of defective µc-Si formation on highly textured substrates in which the atomic H in plasma is assumed to play an important role. We are also developing a non-vacuum deposition technique that we term “Liquid Si Printing.” A new record conversion efficiency for HIT solar cells of 24.7% has been achieved using a very thin c-Si wafer (Thickness: 98 µm, Area: 102 cm2).

In this study, A H2-plasma is studied as a dry method to etch thin layers of amorphous silicon aSi:H(i) deposited on a crystalline wafer. It is found that H2-plasma etches aSi:H(i) selectively toward silicon nitrides hard masks with an etch rate below 3nm/min. Depending on power density and temperature of the substrate during the H2-plasma, the energy bandgap, the hydrides distribution and the void concentration of the aSi:H(i) layers are modified and the amorphous-to-crystalline transition is approached. At high temperature (>250C) and low plasma power (<20mW/cm2), the dihydride (SiH2) content increases and the bandgap widens. The etch rates stays below 0.5 nm/min. At low temperature (<150°C) and high power (>70mW/cm2), the void concentration increases significantly and etch rates up to 3nm/min are recorded.

These findings are supported by a theoretical model that indicates formation of Si-H-Si precursors in the layer during exposure to H2-plasma. According to the experimental conditions, these precursors either diffuses and forms Si-Si strong bonds or are removed from the film, causing layer etching.

The n-type hydrogenated microcrystalline silicon oxide (μc-SiOX:H(n)) films with different stoichiometry have been successfully prepared by varying the CO2-to-SiH4 flow ratio in the PECVD system. By using the μc-SiOX:H(n) as a replacement for μc-Si:H(n) and ITO, the conversion efficiency of μc-Si:H single-junction and a-Si:H/μc-Si:H tandem cells were improved to 6.35% and 10.15%, respectively. The major improvement of the short circuit current density (JSC) and these cell efficiencies were originated from the increased optical absorption, which was confirmed by the quantum efficiency measurement showing increased response in the long-wavelength region. Moreover, the all PECVD process except the metal contact simplified the fabrication and might benefit the industrial production.

We report a preliminary study on the influence of indium doping on ultra-thin film silicon solar cells. The design of the cell reported here is such that it should elucidate the impact of the indium dopant, which is concentrated in the thin film. Indium, a deep level in silicon (0.157 eV above the valence band), acts as a p-type dopant and a sensitizer. Absorption through sub-bandgap transitions is expected based on the previously reported Impurity PhotoVoltaic (IPV) Effect [1]. It is proposed that the implementation of a novel vertical PN junction configuration together with the IPV effect enhances the efficiency of ultra-thin solar cells. The most efficient cell fabricated to date, in our research group, has a conversion efficiency of 4.3 % (active silicon thickness of 2.5 μm), a short-circuit current density of 14.9 mA/cm2 and an open-circuit voltage of 0.51 V under 1 sun illumination. The cell has not been optimized with any type of light trapping technique and 11.24 % of the cell surface is covered by the metal contacts. Numerical simulation indicates that for the geometry used, the maximum efficiency that may be expected is 9.8 % (compared to the 4.3 % measured).

The use of a laser annealing and chemical texturing process (dubbed the LaText process) on room-temperature sputtered ZnO:Al has been shown to generate unusually high haze properties, favorable for thin film silicon solar cells.This is due to the melting of the ZnO:Al layer by the XeCl laser, and the formation of crystalline domains onthe surface, for which the grains and grain boundaries are subsequently etched at different rates. The unusual surface morphology produced through this process can strongly impact the nature of the amorphous or microcrystalline silicon material deposited thereupon. In this paper, we report on results for amorphous silicon devices, for which the surface texture is seen to slightly impact thelight absorption in the material, but more interestingly, also the light-induced degradation of the cells.For co-deposited cells, devices deposited on surfaces with the characteristic "LaText" morphologyundergo a much lesser degradation. Furthermore, the decreased degree of degradation coincides with a notable shift in the Raman scattering peak. This provides a rapid diagnostic for testing multiple textures and deposition parameters.

PECVD growth of the microcrystalline silicon junction on a highly textured amorphous top cell often leads to defective absorber layers and finally to low quality bottom cell. This paper reports on the current status of using an innovative smoothening/reflective layer (SRL) as alternative intermediate reflector between top and bottom cell of a Micromorph tandem device deposited on as-grown highly textured LPCVD ZnO layer. Manufacturing of the SRL layer is realized by “liquid phase” deposition technologies. Optical and electrical properties, smoothening effect and photoelectrical results of Micromorph tandem devices are discussed. The implementation of our novel SRL results in the growth of a crack-free bottom cell and to an efficient current transfer from the bottom to the top cell.

We conduct a comparative study mainly on two types of nc-Si based solar cell structures, a-Si/a-SiGe/nc-Si triple-junction and a-Si/nc-Si double-junction. We have attained comparable initial efficiency for the both solar cell structures, 10.8∼11.8% initial total area efficiency (85 - 95W over an area of 0.79 m2). For better compatibility to our installed manufacturing equipment, we deposit a-Si and a-SiGe component cells with the existing deposition machines. Only nc-Si bottom component cells are prepared in separate deposition machines tailored for nc-Si process. Material properties of nc-Si and TCO films are also studied by Raman spectra, SEM, and AFM.

Low sheet resistance (high mobility) with high transmittance in all wavelength is required for front TCO. High haze value is also required for effective light trapping. For this purpose, we have combined F-doped SnO2 (FTO) with high mobility deposited by LPCVD and reactive ion etching (RIE) processed glass substrate. However, two problems have been found. (1) The mobility of FTO on RIE substrate dropped from that on flat glass (75 to 36 cm2/Vs). To avoid this drop, thicker film is needed. (2) To keep high transmittance with thicker film, lower carrier concentration is needed. But the mobility dropped with lower carrier concentration. In order to solve these constrains, we have adopted a stacked structure using thick non-doped layer of 2700 nm and thin F-doped layer of 500 nm. With this novel approach, we have successfully achieved the high mobility (80 cm2/Vs), low carrier concentration (2.2x1019 /cm3) and high haze value (77% at wavelength of 1000 nm) at the same time. This new developed high-haze SnO2 is a new promising TCO for thin-film Si solar cells.

Hydrogenated amorphous silicon betavoltaic devices are studied both by simulation and experimentally. Devices exhibiting a power density of 0.1 μW/cm2 upon Tritium exposure were fabricated. However, a significant degradation of the performance is taking place, especially during the first hours of the exposure. The degradation behavior differs from sample to sample as well as from published results in the literature. Comparisons with degradation from beta particles suggest an effect of tritium rather than a creation of defects by beta particles.

In this paper we present a monolithically integrated wavelength selector based on a double pin/pin a-SiC:H integrated optical active filter that requires optical switches to select visible wavelengths. Red, green, blue and violet pulsed communication channels are transmitted together, each one with a specific bit sequence. The combined optical signal is analyzed by reading out the generated photocurrent, under violet (400 nm) background applied either from the front or the back side of the device. The front and back backgrounds acts as channel selectors that selects one or more channels by splitting portions of the input multi-channel optical signals across the front and the back photodiodes. The transfer characteristics effects due to changes irradiation side are presented. The relationship between the optical inputs and the corresponding digital output levels is established through a 16-element look-up table to perform the optoelectronic conversion.

Results show that the wavelength selector acts as a reconfigurable active filter that enhances the spectral sensitivity in a specific wavelength range and quenched it in the others, tuning a specific band. A binary weighted RGBV code that takes into account the specific weights assigned to each bit position is presented and establishes the optoelectronic functions.

In this paper we present the design of an optical transmission system, using plastic optical fiber (POF), which operates in the visible range of the electromagnetic spectrum. The optical signals are generated by modulated visible LEDs, transmitted through POF and at the reception end a pin-pin photodetector is implemented. A computer simulation tool dedicated to the analysis of optical circuits was used for preliminary analysis of the optical system. The performance of the optical link was analyzed by BER prediction variation on the transmission rate. The tested optical system was assembled using high efficiency LEDs of the same wavelengths, a commercial POF and a pin-pin photodetector based on a-SiC:H/a-SI:H. This detector behaves as an optical filter with controlled wavelength sensitivity. Different optical signals, obtained by adequate modulation of LED optical sources, were coupled into the POF and the combined optical signal at the fiber termination was directed onto the photodetector active area. The output photocurrent was measured with and without optical bias. Results compare the use of a pin-pin transducer device in free space and in a POF transmission link.

The purpose of this paper is the design of simple combinational optoelectronic circuit based on SiC technology, able to act simultaneously as a 4-bit binary encoder or a binary decoder in a 4-to-16 line configurations. The 4-bit binary encoder takes all the data inputs, one by one, and converts them to a single encoded output. The binary decoder decodes a binary input pattern to a decimal output code.

The optoelectronic circuit is realized using a a-SiC:H double pin/pin photodetector with two front and back optical gates activated trough steady state violet background. Four red, green, blue and violet input channels impinge on the device at different bit sequences allowing 16 possible inputs. The device selects, through the violet background, one of the sixteen possible input logic signals and sends it to the output.

Results show that the device acts as a reconfigurable active filter and allows optical switching and optoelectronic logic functions development. A relationship between the optical inputs and the corresponding digital output levels is established. A binary color weighted code that takes into account the specific weights assigned to each bit position establish the optoelectronic functions. A truth table of an encoder that performs 16-to-1 multiplexer (MUX) function is presented.

In the last decades many techniques have been proposed to manufacture thin (<50µm) silicon solar cells. The main issues in manufacturing thin solar cells are the unavailability of a reliable method to produce thin silicon foils with contained material losses (kerf-losses) and the difficulties in handling and processing such fragile foils. A way to solve both issues is to grow an epitaxial foil on top of a weak sintered porous silicon layer. The porous silicon layer is formed by electrochemical etching on a thick silicon substrate and then annealed to close the top surface. This surface is employed as seed layer for the epitaxial growth of a silicon layer which can be partially processed while attached on the substrate that provides mechanical support. Afterward, the foil can be bonded on glass, detached and further processed at module level. The efficiency of the final solar cell will depend on the quality of the epitaxial layer which, in turn, depends on the seed layer smoothness.

Several parameters can be adjusted to change the morphology and, hence, the properties of the porous layer, both in the porous silicon formation and the succeeding thermal treatment. This work focuses on the effect of the parameters that control the porous silicon formation on the structure of the porous silicon layer after annealing and, more specifically, on the roughness of the top surface. The reported analysis shows how the roughness of the seed layer can be reduced to improve the quality of the epitaxial growth.

In this contribution, we show that the dominant electroluminescent emission of hydrogenated amorphous silicon (a-Si:H) thin-film solar cells follows a diode law, whose radiative ideality factor nr is larger than one. This is in contrast to crystalline silicon and Cu(In, Ga)Se2 solar cells for which nr equals one. As a consequence, the existing quantitative analysis for the extraction of the local junction voltage Vj(r) from luminescence images fails for a-Si:H solar cells. We expand the existing analysis method, and include the radiative ideality factor nr into the model. With this modification, we are able to determine the local junction voltage Vj(r) for a-Si:H solar cells and modules. We investigated the local junction voltage Vj(r) and the radiative ideality factor nr for both initial and stabilized a-Si:H solar modules. Furthermore, we show that the apparent radiative ideality factor is affected by the spectral sensitivity of the used camera system.

We have performed an analysis on three hydrogenated nanocrystalline silicon (nc-Si:H) based solar cells. In order to determine the impact that impurities play in shaping the material properties, the XRD and Raman spectra corresponding to all three samples were measured. The XRD results, which displayed a number of crystalline silicon-based peaks, were used in order to approximate the mean crystallite sizes through Scherrer's equation. Through a peak decomposition process, the Raman results were used to estimate the corresponding crystalline volume fraction. It was noted that small crystallite sizes appear to favor larger crystalline volume fractions. This dependence seems to be related to the oxygen impurity concentration level within the intrinsic nc-Si:H layers.

We propose an implementation of the PCD technique to minority carrier effective lifetime assessment in crystalline silicon at 77K. We focus here on (n)-type, FZ, polished wafers passivated by a-Si:H deposited by PECVD at 200°C. The samples were immersed into liquid N2 contained in a beaker placed on a Sinton lifetime tester. Prior to be converted into lifetimes, data were corrected for the height shift induced by the beaker. One issue lied in obtaining the sum of carrier mobilities at 77K. From dark conductance measurements performed on the lifetime tester, we extracted an electron mobility of 1.1x104 cm².V-1.s-1 at 77K, the doping density being independently calculated in order to account for the freezing effect of dopants. This way, we could obtain lifetime curves with respect to the carrier density. Effective lifetimes obtained at 77K proved to be significantly lower than at RT and not to depend upon the doping of the a-Si:H layers. We were also able to experimentally verify the expected rise in the implied Voc, which, on symmetrically passivated wafers, went up from 0.72V at RT to 1.04V at 77K under 1 sun equivalent illumination.

In this study, we employed Multiple Internal Reflection Infrared Spectroscopy (MIR-IR) to characterize chemical bonding structures of boron doped hydrogenated amorphous silicon (a-Si:H(B)). This technique has been shown to provide over a hundred fold increase of detection sensitivity when compared with conventional FTIR. Our MIR-IR analyses reveal an interesting counter-balance relationship between boron-doping and hydrogen-dilution growth parameters in PECVD-grown a-Si:H. Specifically, an increase in the hydrogen dilution ratio (H2/SiH4) was found to cause the increase in the Si-H bonding and a decrease in the B-H and SiH2 bonding, as evidenced by the changes in corresponding IR absorption peaks. In addition, although a higher boron dopant gas concentration was seen to increase the BH and SiH2 bonding, it also resulted in the decrease of the most stable SiH bonding configuration. The new chemical bonding information of a-Si:H thin film was correlated with the various boron doping mechanisms proposed by theoretical calculations.

The PECVD intrinsic, n+, and p+ a-Si:H thin film deposition processes have been studied by the optical emission spectroscope to monitor the plasma phase chemistry. Process parameters, such as the plasma power, pressure, and gas flow rate, were correlated to SiH*, Hα*, and Hβ* optical intensities. For all films, the deposition rate increases with the increase of the SiH* intensity. For the doped films, the Hα*/SiH* ratio is a critical factor affecting the resistivity. The existence of PH3 or B2H6 in the feed stream enhances the deposition rate. Changes of the free radicals intensities can be used to explain variation of film characteristics under different deposition conditions.

A simple derivation of sub-bandgap exponential tails and fundamental absorption equations ruling the optical absorption of amorphous semiconductors are presented following the frozen phonon model. We use the Kubo-Greenwood formula to describe the average transition rate for the optical absorption process. Asymptotic analysis leads to the commonly observed exponential tail as well as the Tauc expression for the fundamental absorption. We test our theoretical results with experimental absorption coefficients of amorphous Si:H, SiC:H, AlN and SiN. The validity of the Urbach focus concept is evaluated.