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Panasonic’s Thin Film Silicon Technologies for Advanced Photovoltaics

Published online by Cambridge University Press:  10 May 2013

Akira Terakawa ,
Hiroko Murayama ,
Yohko Naruse ,
Hirotaka Katayama ,
Takeyuki Sekimoto ,
Shigeo Yata ,
Mitsuhiro Matsumoto ,
Isao Yoshida ,
Mitsuoki Hishida  and
Youichiro Aya
...Show all authors
Akira Terakawa
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Hiroko Murayama
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Yohko Naruse
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Hirotaka Katayama
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Takeyuki Sekimoto
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Shigeo Yata
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Mitsuhiro Matsumoto
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Isao Yoshida
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Mitsuoki Hishida
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Youichiro Aya
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Masahiro Iseki
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Mikio Taguchi
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
Makoto Tanaka
Affiliation:
Panasonic Corporation 3-1-1 Yagumo-naka-machi, Moriguchi 570-8501, Japan
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Abstract

We have fabricated high-efficiency a-Si/µc-Si tandem solar cells and modules with a very high µc-Si deposition rate using Localized Plasma Confinement CVD to give very high-rate deposition (>2.0 nm/s) of device-grade µc-Si layers. For further progress in productive plasma-CVD techniques, we have studied plasma phenomena by combining newly developed plasma simulation and plasma diagnosis techniques that reveal the importance of non-emissive atomic hydrogen. We also have proposed a model of defective µc-Si formation on highly textured substrates in which the atomic H in plasma is assumed to play an important role. We are also developing a non-vacuum deposition technique that we term “Liquid Si Printing.” A new record conversion efficiency for HIT solar cells of 24.7% has been achieved using a very thin c-Si wafer (Thickness: 98 µm, Area: 102 cm2).

Keywords

amorphousSiphotovoltaic
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1536: Symposium A – Film Silicon Science and Technology , 2013 , pp. 17 - 26
Copyright
Copyright © Materials Research Society 2013 

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References

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