A fabrication technology for high-quality, device-grade microcrystalline silicon (μc-Si) thin film with a higher deposition rate has been required to reduce the production cost of amorphous silicon (a-Si)/μc-Si tandem modules. Localized Plasma Confinement CVD (LPC-CVD) has been proposed as one solution to this problem. It was found that this CVD is suitable for the deposition of high crystalline fractions and (220) orientation in the development of small-to-medium-size substrates. Since then, we have been developing high-rate deposition technology for production-size substrates by using the essence of LPC-CVD and evaluation techniques for μc-Si materials and plasma. A stabilized module efficiency of 11.1% was reported with a very high deposition rate on a production-size substrate. To improve conversion efficiency, we have been focusing on elemental technologies as well as high-rate deposition technology. Stabilized conversion efficiency of 12.2% for small-size cells (1 cm2) and stabilized module conversion efficiency of 10.7% for production-size substrates were achieved.

Over the past decade, the PV industry has witnessed tremendous growth in manufacturing scale and technology advancement, with PV generated electricity cost ever approaching grid parity. Among them, Si based thin film technology has made substantial progress in demonstrating its inherent advantages in lower material cost, ease of manufacturing and higher energy yield, etc. More recently, reduced product prices and competing technologies from crystalline silicon and other thin film technologies have made amorphous and microcrystalline silicon based thin film technology very challenging, and requires further increase in module efficiency and decrease in manufacturing cost. As one of the few companies in the world with significant manufacturing capacity for tandem thin film Si PV products, Chint Solar (Astronergy) has been at the forefront of technology development for the mass production of large-scale (Gen. 5, 1.43m2) Si thin film solar modules in the last 5 years. We will review major technology advancements which have been mass production proven and led to the mass produced tandem silicon thin film module with 10.0% plus stabilized efficiency, along with the field performance of those modules.

Thin‑film silicon solar cells based on hydrogenated amorphous silicon (a‑Si:H) and hydrogenated microcrystalline silicon (μc‑Si:H) absorber layers are typically deposited using static plasma-enhanced chemical vapor deposition (PECVD) processes. It has been found that the use of very‑high frequencies (VHF) is beneficial for the material quality at high deposition rates when compared to radio-frequency (RF) processes. In the present work a dynamic VHF‑PECVD technique using linear plasma sources is developed. The linear plasma sources facilitate the use of very-high excitation frequencies on large electrode areas without compromising on the homogeneity of the deposition process. It is shown that state-of-the-art a‑Si:H and μc‑Si:H single-junction solar cells can be deposited incorporating intrinsic layers grown dynamically by VHF-PECVD at 0.35 nm/s and 0.95 nm/s, respectively.

Multi-junction solar cells incorporating hydrogenated nanocrystalline silicon (nc-Si:H) exhibit a high current capability and low light-induced degradation. In this paper, we report our recent progress in developing nc-Si:H solar cells using a modified very-high-frequency glow discharge technique. We achieved a short-circuit current density >30 mA/cm2and 10.6% conversion efficiency from single-junction solar cells. Using the improved nc-Si:H cells in an a-Si:H/nc-Si:H/nc-Si:H triple-junction structure, we attained initial and stabilized efficiencies of 13.9% and 13.6%, respectively. Issues related to improving material properties and device structures are addressed. Besides using the conventional techniques, such as hydrogen dilution profiling, optimized Ag/ZnO back reflector, and buffer layers, we found that compensation from Boron and Oxygen micro-doping is also critical in obtaining the above achievements.

Substrates with extremely low roughness to allow the growth of good-quality silicon material but that nevertheless present high light trapping properties are presented. In a first application, silver reflectors are used in single and tandem-junction amorphous silicon (a-Si:H) solar cells. High initial (stable) efficiencies of 10.4 % (8.1 %) for single-junction a-Si:H cells on glass and 11.1 % (9.2 %) for tandem-junction a-Si:H/a-Si:H cells on plastic are obtained. A second application better suited to multi-junction solar cells based on microcrystalline silicon (μc-Si:H) solar cells is presented: the substrate consists of rough zinc oxide (ZnO) grown on a flat silver reflector which is covered with a-Si:H; polishing of this structure yields an a-Si:H/ZnO interface that provides high light scattering even though the cell is deposited on a flat interface. We present results of ∼ 4-μm-thick μc-Si:H solar cells prepared on such substrates with high open-circuit voltages of 520 mV. A large relative efficiency gain of 20% is observed compared to a co-deposited cell grown directly on an optimized textured substrate.

As an alternative to crystalline silicon or thin film solar cells on rigid glass substrates, we aim to fabricate amorphous silicon (a-Si)/nanocrystalline silicon (nc-Si) tandem thin film solar cells on cheap flexible substrates. We have chosen polycarbonate as the superstrate and adapted the a-Si and nc-Si deposition processes for deposition at a maximum temperature of 130°. Because a-Si deposited at low temperatures has a high band gap, we were able to fabricate very thin (<1.2 μm) a-Si/nc-Si solar cells, because the high band gap of the a-Si shifts the current generation more towards the bottom cell, allowing for a much thinner (900 nm) bottom cell. The somewhat lower Jsc of the complete cell is partly compensated by a higher Vocwhich results in an initial conversion efficiency of 9.5% for the low temperature tandem solar cells on glass.

In this contribution, we study the increase in metalorganic-low pressure chemical vapor deposited (MO-LPCVD) ZnO thin films conductivity by hydrogen plasma post-treatment. We show that this improvement is linked to defect passivation at grain boundaries, decreasing the electron traps density and resulting in the almost complete suppression of the electron scattering at grain boundaries. For a 2 μm thick non-intentionally doped ZnO layer, electron mobility reaches after treatment values close to 60 cm2V-1s-1 (corresponding to an increase of 100%), with a carrier density still as low as 3 x1019 cm-3 (+1.5 x1019 cm-3). Such layers have an absorbance below 2-3% in the range of 400 to 1100 nm making them among the most transparent and conductive materials reported so far. In addition, we demonstrate that hydrogen plasma post-treated ZnO layers can be used as front electrode for producing highly transparent and conductive electrodes. Eventually, it is shown that hydrogen plasma treatment can also be used on the complete thin film solar cell stack (back contact and silicon device) to improve the cell performances.

Hydrogenated polymorphous silicon (pm-Si:H) is one of the most promising candidates for a stable top cell material in multi-junction thin film solar cells. Solar cells using pm-Si:H as their absorbing layer show very interesting degradation kinetics when compared to hydrogenated amorphous silicon (a-Si:H), summarized by macroscopic structural changes and irreversible changes in solar cell characteristics, while nevertheless preserving a higher stabilized efficiency. Notably, pm-Si:H solar cells, once degraded, respond to neither annealing nor further light-soaking. Such results suggest a device degradation mechanism including structural changes, active hydrogen motion, and interface delamination mediated by fast hydrogen diffusion and accumulation at the interface. Interestingly, a similar behavior was reported for a-Si:H solar cells under severe light soaking conditions (at 350 °C or under 50 suns) while pm-Si:H solar cells show such behavior under 1 sun at 40 °C.

Intermediate layers between silicon and borosilicate glass are investigated for compatibility with a diode laser crystallization technique for fabrication of thin-film polycrystalline silicon solar cells. SiCx, SiNx and SiOx layers or multilayer stacks of these materials have allowed silicon films of 10μm thickness to be successfully crystallized by diode laser irradiation without dewetting, with each option offering different advantages. SiCx allows the most robust crystallization process, while SiOx is the best barrier to contamination and the most stable layer. SiNx offers the best anti-reflection coating for superstrate configured solar cells. Presently, best device performance is achieved with a SiOxintermediate layer with cells achieving up to ∼540 mV open-circuit voltage.

We report the results of using n-type hydrogenated nanocrystalline silicon oxide alloy (nc-SiOx:H) in hydrogenated nanocrystalline silicon (nc-Si:H) and amorphous silicon germanium alloy (a-SiGe:H) single-junction solar cells. We used VHF glow discharge to deposit nc-SiOx:H layers on various substrates for material characterizations. We also used VHF glow discharge to deposit the intrinsic layer in nc-Si:H solar cells. RF glow discharge was used for the deposition of the doped layers and the intrinsic layer in a-SiGe:H solar cells. Various substrates such as stainless steel (SS), Ag coated SS, and ZnO/Ag coated SS were used for different cell structures. We found that by using nc-SiOx:H to replace the ZnO and the a-Si:H n-layer in nc-Si:H solar cells, the cell structure is greatly simplified, while the cell performances remain nearly identical to those made using the conventional n-i-p structure on standard ZnO/Ag BR’s. Solar cells with nc-SiOx:H as the n layer directly deposited on textured Ag show similar quantum efficiency (QE) as the n-i-p cells on ZnO/Ag BRs. In both cases, QE is higher than that in the n-i-p cells made directly on Ag coated SS. This effect is probably caused by the shift of surface plasmon-polariton resonance frequency due to the difference in index of refraction of ZnO, nc-SiOx:H, and Si.

We recently developed a scattering model based on the scalar scattering theory. In this contribution we present how we used the scattering model to investigate interface textures with optimized scattering properties. We used the simulated annealing algorithm to find optimized surface textures and applied the ASA device simulator to evaluate the influence of these optimized textures on the performance of thin film silicon solar cells. We found that the lateral feature size of the textures is crucial for efficient scattering of the incident light.

Current-matching between junctions in a multi-junction photovoltaic device is fundamental for its performance prediction: the measurement of the spectral response of each junction provides a valuable information to optimize the device performance. Various aspects make spectral response measurements of such devices particularly challenging. In this work these aspects are analysed theoretically and guidelines to avoid their impact in the experimental practice are given.

We describe the properties of nano-crystalline silicon based alloy (nc-SiXY) prepared by a very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique with silane (SiH4) and XY gas mixtures and diluted in hydrogen (H2) at low deposition temperature. Varying the gas ratio among SiH4, H2 and XY gasses could alter the optical bandgap and structure. The nc-Si films with high crystalline volume fraction were first prepared, and then the XY gasses were added in order to tune the microstructure and opto-electronic properties of this nano-crystalline silicon based alloy. We have characterized the materials using UV-VIS-NIR, Raman, Constant Photocurrent Method (CPM), dark- and photo-conductivity. As XY gas flows were increased, the optical bandgap of nc-SiXY films increased, while its crystalline volume fraction and conductivity decreased. With proper control of the silane concentration, XY/SiH4 gas ratio, and deposition pressure, we have fabricated the nc-SiXY film with optical bangap of about 1.5eV. Applying this material as the absorber layer in p-i-n devices with configuration of textured ZnO/nc-p+/nc-SiXY/a-n+/Ag, the efficiency is 7.25% (Voc=0.616V, Jsc=17.69mA/cm2, FF= 0.666) with thickness of ∼0.8μm.

Oxide-metal-oxide structures are an alternative to single material transparent electrical contacts. Among other advantages, these multilayer systems provide good conductivity and transmittance, even when fabricated at room temperature. Low temperature processing is a requirement for silicon thin-film solar cells on various flexible substrates. The design and fabrication of oxide-metal-oxide structures based on ZnO:Al and Ag are investigated in this work. Further the integration of an optimized multilayer electrode into an amorphous silicon solar cell in substrate configuration was performed. Measurement results and possible loss mechanisms are discussed.

In efforts to achieve higher efficiency of thin film Si solar cell, light trapping is one of the most important strategies in designing the cell structure. From the past studies, it is well known that TCO with a higher haze can exhibit better light trapping characteristics for a superstrate type thin film Si solar cell, while such TCO could give lower Voc and FF values caused by steep valleys in the texture of TCO. Furthermore, TCO with too high haze in a longer wavelength region could make back reflectance at the Ag rear electrode/reflector lower due to plasmonic effect on rough surface of Ag and thus reduces the efficiency of light trapping. In order to solve this contradictory behavior of light trapping in a conventional thin film Si solar cell, we have newly developed a glass-laminated module of thin film Si solar cell which has enhanced light trapping without deteriorating Voc nor high reflectance of Ag rear reflector.

We study the effect of the spacing between electrodes in very high frequency plasma enhanced chemical vapor deposition on the properties of microcrystalline silicon films and their related n-i-psolar cells. We vary the spacing from 0.2 to 1.0 cm to deposit microcrystalline silicon at 67.8 MHz while maintaining other growth parameters. The spacing between the electrodes significantly changes the plasma conditions, which govern film precursor chemistry as well as introduce etching and ion bombardment to the film; thereby, influencing nucleation and growth of the microcrystalline Si films. The resulting films were characterized by UV-Vis spectrometry, atomic force microscopy, X-ray diffraction, and transmission electron microscopy. We found that deposition rate decreases, while surface roughness and short circuit current density increase with smaller spacing.

Light trapping due to rough transparent conductive oxide (TCO) surfaces is a common and industrially applied technique in thin film silicon solar cells. In this study, we demonstrate a novel light trapping solution using electrochemically deposited, highly doped zinc oxide (ZnO) nanorod arrays which goes beyond standard light management concepts. The n-doped ZnO rods enable the application as front electrode in superstrate configuration. We explain our experimental results by multidimensional solar cell simulations and show how the nanorod array geometry influences the cell performance. The requirement is demonstrated to choose an appropriate average nanorod distance which strongly influences the electrical cell characteristics. The results clearly outline the potential of TCO nanorod technology for enhanced light trapping.

Light trapping is essential to harvest long wavelength red and near-infrared photons in thin film silicon solar cells. Traditionally light trapping has been achieved with a randomly roughened Ag/ZnO back reflector, which scatters incoming light uniformly through all angles, and enhances currents and cell efficiencies over a flat back reflector. A new approach using periodically textured photonic-plasmonic arrays has been recently shown to be very promising for harvesting long wavelength photons, through diffraction of light and plasmonic light concentration. Here we investigate the combination of these two approaches of random scattering and plasmonic effects to increase cell performance even further. An array of periodic conical back reflectors was fabricated by nanoimprint lithography and coated with Ag. These back reflectors were systematically annealed to generate different amounts of random texture, at smaller spatial scales, superimposed on a larger scale periodic texture. nc-Si solar cells were grown on flat, periodic photonic-plasmonic substrates, and randomly roughened photonic-plasmonic substrates. There were large improvements (>20%) in the current and light absorption of the photonic-plasmonic substrates relative to flat. The additional random features introduced on the photonic-plasmonic substrates did not improve the current and light absorption further, over a large range of randomization features.

In this work, the development of hydrogenated amorphous silicon oxide (a-SiOx:H) absorber, a-SiOx:H single-junction solar cells and a-SiOx:H/a-Si1-xGex:H tandem solar cells were presented. The oxygen content of the a-SiOx:H materials controlled by changing CO2-to-SiH4 flow ratio had significant influence on its opto-electrical property. As CO2/SiH4 increased from 0 to 2, the bandgap increased from 1.75 to 2.13 eV while the photo-conductivity decreased from 8.25×10-6 to 1.02×10-8 S/cm. Photo-response of over 105 can be obtained as the bandgap was approximately 1.90 eV. The performance of single-junction solar cells revealed a better efficiency can be obtained as the absorber bandgap was in the range of 1.83 to 1.90 eV. Further increase of the absorber bandgap may lead to the increase in bulk defect density which deteriorated the cell efficiency. Finally, a-SiOx:H/a-Si1-xGex:H tandem solar cell was fabricated with the absorber bandgap of 1.90 eV in the top cell. By matching the current between the component cells, the tandem cell efficiency of 7.38% has been achieved.

The challenge for all photovoltaic technologies is to maximize light absorption, convert photons with minimal losses to electrical charges and efficiently extract them towards the electrical circuit. For thin film silicon solar cells, a compromise must be found as light trapping is usually performed through textured interfaces, that are detrimental to the subsequent growth of dense and high quality silicon layers. We introduce here the concept of smoothening intermediate reflecting layers (IRL), enabling to combine high currents and good electrical quality in Micromorph devices in the superstrate configuration. After exposing the motivation for such structures, we validate the concept by showing a VOCenhancement when employing a polished silicon-oxide-based IRL. Shunting issues and additional reflection losses are pointed out with such technique, highlighting the need to develop alternative techniques for an efficient morphology adaptation before the microcrystalline silicon cell growth.