Symposium B – In-Situ Patterning: Selective Area Deposition and Etching
Research Article
Control of Etching in Laser—Chemical Reaction of Mn—Zn Ferrite by MeV Ion Implantation
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- 21 February 2011, 301
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X-Ray Photoemission Investigation of Excimer Laser Induced Etching of InP
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- 21 February 2011, 307
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Selective Etching and Photo—Bleaching in Thin Amorphous Ge—Sb—S Films
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- 21 February 2011, 313
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Copper Vapor Laser Used in Etching and Deposition
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- 21 February 2011, 319
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Excimer Laser-Assisted Etching of Silicon Using Chloropentafluoroethane
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- 21 February 2011, 325
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Local Laser Induced Etching of Copper Films by Chlorine
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- 21 February 2011, 331
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Selective Silicon Epitaxy for Advanced Dram Structures
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- 21 February 2011, 339
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Selective Epitaxy of AlxGa1−x as and AlxGal−x as Based Structures
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- 21 February 2011, 351
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Surface Reaction Mechanisms in Selected Area Epitaxy of II-VIs
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- 21 February 2011, 357
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Novel Stacked CMOS Process by Local Overgrowth
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- 21 February 2011, 365
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Optimized Molecular Beam Epitaxy Structures for GaAs on Silicon Photodetectors
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- 21 February 2011, 371
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Laser Selective Area Epitaxy for the Potential of Optoelectronic Integration
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- 21 February 2011, 377
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Laser Induced Surface Chemical Epitaxy of II-VI Materials
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- 21 February 2011, 381
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Xps Studies of Chlorine Etching Interactions with GaAs(100)
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- 21 February 2011, 389
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A Process Model for Reactive Ion Etching and Study of the Effects of Magnetron Enhancement
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- 21 February 2011, 395
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Etching of GaAs on AlGaAs in Rie-Mode
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- 21 February 2011, 401
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Downstream Etching of GaAs and InP Using Molecular Chlorine and Chlorine Radicals
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- 21 February 2011, 407
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Hollow Cold Cathode Ion Source for Reactive Ion-Beam Etching
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- 21 February 2011, 413
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Reactive Ion Etching of In-Based III-V Semiconductors -Comparison of Cl and C2H6 Chemistries
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- 21 February 2011, 417
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Elevated Temperature Reactive Ion Etching of GaAs and AIGaAs in C2H6 / H2
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- 21 February 2011, 425
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