Symposium S – Silicon Front-End Processing-Physics & Technology of Dopant…
Research Article
Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing
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- Published online by Cambridge University Press:
- 10 February 2011, 283
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Estimation of the Number of Injected Interstitial Atoms during Nitrous Oxidation of Silicon
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- Published online by Cambridge University Press:
- 10 February 2011, 289
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