This study focuses on establishing a microstructural and morphological correlation between CIGS films and its precursor layer of Molybdenum (Mo) coated soda-lime glass (SLG). Therefore, variations in the morphology and microstructural properties of Mo thin films, using DC planar magnetron sputtering, were induced systematically by varying the sputtering pressure from 0.6 to 16 mT with a sputtering power density of 1.2 W/cm2. Subsequently, under fixed deposition conditions (deposition rate and substrate temperature), a growth of Cu(In,Ga)Se2 (CIGS) films was carried out on the Mo-coated SLG substrates, using the 3-stage growth process of the physical vapor deposition (PVD) technique.
High-Resolution Scanning Electron Microscopy (HRSEM) was used to examine the Mo and CIGS films morphology. X-Ray Diffraction (XRD) was applied to study in detail the microstructure of Mo and CIGS films. Where, the films’ crystal structure including the preferred orientation and the lattice parameters were determined by the θ/2θ XRD technique and by applying Cohen’s least-square method. Furthermore, Atomic Force Microscopy (AFM) was used to determine the root-mean-square (RMS) surface roughness of the CIGS films.