In the last years, perovskite solar cells have attracted great interest in photovoltaic (PV) research due to their possibility to become a highly efficient and low-cost alternative to silicon solar cells. Cells based on the widely used Pb-containing perovskites have reached power conversion efficiencies (PCE) of more than 20 %. One of the major hurdles for the rapid commercialization of perovskite photovoltaics is the lack of deposition tools and processes for large areas. Chemical vapor deposition (CVD) is an appealing technique because it is scalable and furthermore features superior process control and reproducibility in depositing high-purity films. In this work, we present a novel showerhead-based CVD tool to fabricate perovskite films by simultaneous delivery of precursors from the gas phase. We highlight the control of the perovskite film composition and properties by adjusting the individual precursor deposition rates. Providing the optimal supply of precursors results in stoichiometric perovskite films without any detectable residues.

Metal Ir films were prepared by spray chemical vapor deposition (CVD) in air from an Ir precursor, (1,3-cyclohexadiene)(ethylcyclopentadienyl)iridium, Ir(EtCp)(CHD). Film deposition was ascertained at 270–430°C on a SiO2/Si substrate and the deposition rate increased with the deposition temperature but was saturated above 330°C. The obtained films consisted of Ir metal without any iridium oxide impurity irrespective of the deposition temperature. Films tended to orient to (111) with increasing deposition temperature. Resistivity of these Ir films decreased with increasing film thickness and reached to values on the order of 10-6 Ω・cm, which was the same order of the values for bulk Ir metal. Good step coverage was observed for the Ir metal films deposited at 270°C and 330°C. This shows that the simple spray CVD process in air is a good candidate for depositing Ir metal films with good conductivity and step coverage.

Zinc Oxide (ZnO) has been shown to exhibit semiconducting and piezoelectric dual properties. This has led to a large commercial demand on ZnO for optoelectronics that operate at the blue-ultraviolet regions. Consequently, varying techniques have been devised to create different nanostructures of ZnO. Here, the single step synthesis of ZnO nanostructures was performed on Si(100) substrates with a thin ZnO seed-layer. A modified chemical vapor deposition (CVD) method was developed to accomplish the structure formation. Sb doping of the structures in the gas phase was performed to study its effects on structure and optoelectronic properties. Different structures were realized including nanofilaments, nanoparticles, microflowers, nanorods, nanotubes, and nanocolumns. Only nanorods/columns, and nanotubes are shown in this work. Morphology was examined using scanning electron microscopy (SEM). Energy-dispersive X-ray spectroscopy (EDS) and X-ray powder diffraction (XRD) were used for structural studies. Optoelectronic properties were explored using room-temperature photoluminescence (PL) spectroscopy. PL data show the relative decrease in the number of defects and increase in crystal quality upon increasing reaction time. Significant structural effects were also observed upon doping. Some structural defects might be attributed to the diffusion of Sb ions into the lattices of ZnO, replacement of Zn by Sb, and ionic radii difference. These stacking faults are most likely the reason behind the dominance and broadening of DLE peak.

Molybdenum disulfide (MoS2) is expected to be applied for devices in various fields owing to its unique characteristics. Establishing a high-productivity manufacturing method which yields high quality films is an important and unresolved issue for the practical applications of MoS2. Among different techniques conducted by researchers all over the world, our approach is cold-wall metal-organic chemical vapor deposition, and we previously reported the deposition of MoS2 with i-Pr2DADMo(CO)3, a novel Mo precursor [S. Ishihara, et al., MRS Advances 3, 379-384 (2018).]. In this study, with the aim of further improving the quality of the MoS2 film using this new Mo precursor, various film formation conditions were controlled and the influence on the film quality was investigated. X-ray photoelectron spectroscopy, atomic force microscopy and Raman spectroscopy were used as evaluation techniques of the samples. As a result, mm-scale uniform film was formed with the deposition time less than 30 min. at temperature as low as 400 °C to 500 °C. It was revealed that maintaining low Mo/S supply ratio (SRMo/S) is crucial in fabricating high quality films.

Bulk production by Chemical Vapor Deposition (CVD) of ultra-long Carbon Nanotubes (CNTs) with lengths greater than several centimeters is desirable for materials applications, but is not presently feasible. A principal reason for this limitation is cessation of CNT growth due to erosion of the nano-sized catalyst particles from which the CNTs nucleate and grow: at elevated CVD growth temperatures, atoms of catalytic metal detach and diffuse away from the particles, resulting in erosion and eventual deactivation of the particles. Recently, a novel idea was introduced to slow this diffusion and erosion by including heavy refractory metals with the catalyst metals in the nanoparticles. Here are presented recent and ongoing investigations into this method. The metal system investigated uses iron as catalyst and rhenium as diffusion inhibitor. Results show that inclusion of Re in the catalyst particles will substantially increase the catalysts particle lifetimes, and hence the growth time of the CNTs produced. These results are compared to previous results obtained using the iron/molybdenum system of catalyst/inhibitor.

Bendable p-type NiO and n-type In2O3 thin films were epitaxially grown on synthetic mica using mist chemical vapor deposition. It was found that at a growth temperature of 400 °C, epitaxially grown cubic (111) NiO thin films developed twin rotational domains, and the epitaxial relationship between each domain and the substrate was (111) NiO [1-10] or [10-1] || (001) synthetic mica [100]. In the visible light region, the epitaxial NiO thin films showed high transparencies, and their cut-offs appeared in the UV region. Additionally, at a growth temperature of 500 °C, cubic (111) In2O3 thin films with and without Sn doping were epitaxially grown on synthetic mica. As a result of the plasma oscillation of free carriers, Sn-doped In2O3 thin films exhibited reflection characteristics in the infrared region, while maintaining their visible light transmission characteristics. Furthermore, compared with non-doped In2O3, Sn doping decreased the sheet resistance by two digits.

We report a novel strategy to render stainless steel (SS) a more versatile material that is suitable to be used as the substrate for preparing electrodes for efficient hydrogen evolution by interface engineering. Our strategy involves the growth of carbon nanotubes (CNTs) by atmospheric pressure chemical vapor deposition (APCVD) as the interface material on the surface of SS. We optimized the procedure to prepare CNTs/SS and demonstrate a higher activity of the CNTs/SS prepared at 700 °C for the hydrogen evolution reaction (HER) when compared to samples prepared at other temperatures. This can be attributed to the higher number of defects and the higher content of pyrrolic N obtained at this temperature. Our strategy offers a new approach to employ SS as a substrate for the preparation of highly efficient electrodes and has the potential to be widely used in electrochemistry.

Wide-bandgap oxide semiconductors have received significant attention as they can produce devices with high output and breakdown voltage. p-Type conductivity control is essential to realize bipolar devices. Therefore, as a rare wide-bandgap p-type oxide semiconductor, NiO (3.7 eV) has garnered considerable attention. In view of the heterojunction device with Ga2O3 (4.5–5.0 eV), a p-type material with a large bandgap is desired. Herein, we report the growth of a Ni1-xMgxO thin film, which has a larger bandgap than NiO, on α-Al2O3 (0001) substrates that was developed using the mist chemical vapor deposition method. The Ni1-xMgxO thin films epitaxially grown on α-Al2O3 substrates showed crystallographic orientation relationships identical to those of NiO thin films. The Mg composition of Ni1-xMgxO was easily controlled by the Mg concentration of the precursor solution. The Ni1-xMgxO thin film with a higher Mg composition had a larger bandgap, and the bandgap reached 3.9 eV with a Ni1-xMgxO thin film with x = 0.28. In contrast to an undoped Ni1-xMgxO thin film showing insulating properties, the Li-doped Ni1-xMgxO thin film had resistivities of 101–105 Ω∙cm depending on the Li precursor concentration, suggesting that Li effectively acts as an acceptor.

In the search for chemically stable two-dimensional (2D) materials with high in-plane mobility, proper bandgap, and compatibility with vapor-based fabrication, van der Waals semiconductor SiP has become a potential candidate as a robust variation of black phosphorous. While bulk SiP crystals were synthesized in the 1970s, the vapor-based synthesis of SiP nanostructures or thin films is still absent. We here report the first chemical vapor growth of SiP nanostructures on SiO2/Si substrate. SiP islands with lateral size up to 20 μm and showing well-defined Raman signals were grown on SiO2/Si substrate or on SiP-containing concentric rings. The presence of SiP phase is confirmed by XRD. The formation of rings and islands is explained by a multiple coffee ring growth model where a dynamic fluctuation of droplet growth front induces the topography of concentric ring surfaces. This new growth method might shed light on the controlled growth of group IV-III high-mobility 2D semiconductors.

This work demonstrates the in situ growth of carbon nanowalls (CNWs) on diamond semiconductors by microwave plasma-assisted chemical vapor deposition. The resulting CNW/diamond junctions behave as photomemristors having both photocontrollable multiple resistance states and nonvolatile memory functions. The resistance state (high or low resistance) can be selected by irradiation with blue or violet light in conjunction with the application of a bias voltage, giving a large resistance switching ratio of ∼106. The photoinduced resistance switching behaviors are rarely observed and has only been observed in a few materials and/or heterostructures. These junctions also exhibit a photoresponsivity of ∼12 A/W, which is much larger than that obtained from photodiodes composed of other materials. These results suggest that CNW/diamond (i.e., carbon sp2/sp3) junctions could have applications in novel photocontrollable devices, which have photosensing, memory, and switching functions.

In the past years, numerous alternative cations to replace Pb2+ in perovskite solar cells have been investigated. In terms of toxicity and chemical stability, methylammonium bismuth iodide [(CH3NH3)3Bi2I9 or MBI] containing the Bi3+ cation has been considered as a promising material. However, fabrication of coherent MBI films remains challenging. Recently, significant progress has been achieved by using vapor deposition processes. Compared with solution-processed ones, vapor-deposited MBI solar cells show higher fill factors and efficiencies. In this work, chemical vapor deposition (CVD) of MBI is investigated. Employing nitrogen as carrier gas, the precursors bismuth iodide (BiI3) and methylammonium iodide (MAI) are deposited sequentially over several cycles and form MBI during the process. In order to form dense and coherent layers, the lengths of the deposition cycles as well as the substrate temperature have been optimized. Scanning electron microscopy reveals the strong influence of both parameters on growth and crystal properties. Optimized films of MBI integrated into solar cells show that CVD of MBI is a promising method for fabricating large-area solar cells.

The present work is aimed to study a comparison among synthesized graphene films, deposited on copper substrates and commercial graphene films; both decorated with Eu2O3 particles, with the purpose of promoting photoluminescence. The decoration procedure was achieved using the radio frequency sputtering (R.F. Sputtering) technique for the deposition of Eu2O3 on synthesized or commercial graphene films. The SEM obtained images, show differences in morphology when commercial and synthesized graphene films are compared. Our results indicate that the type of surface is the main factor that accounts for the europium oxide spatial distribution that ultimately leads to luminescence enhancing. The x-ray photoelectron spectroscopy (XPS) analyses, showed the trivalent oxidation state of europium and the atomic content of Europium for both; the commercial graphene film and synthesized one, where the first one presented the higher europium concentration. Analysis by Raman spectroscopy reveals that graphene films become disordered after the decoration is achieved. The main Raman bands of the commercial graphene films undergo a remarkable red shift, as a consequence of the presence of europium oxide It was observed that the interaction of Eu2O3 with the sp2 levels of graphene, improves the red photoluminescence of the samples grown on both, commercial and prepared graphene films.

Cesium lead iodide perovskite (CsPbI3) with excellent optical and electrical properties have attracted numerous academic attentions. Specifically, the black cubic phase CsPbI3 with a direct band gap of 1.74 eV has been most appropriate materials for various optoelectronic applications, especially for photovoltaic (PV), Light-Emitting Diodes (LED) and photodetector applications1. However, the preferred cubic phase of bulk CsPbI3 (α-CsPbI3) is usually only stable at high temperatures and it will undergo an immediate phase transformation to orthorhombic phase (δ-CsPbI3) after fabrication at room temperature. In this work, we have discovered a convenient CVD method to investigate the growth behavior of the cubic α-CsPbI3 film on the porous alumina substrate. The lead iodide and cesium iodide were used as the precursors for the deposition of CsPbI3. The porous alumina with high surface area and large pore volume was used as growth substrate. It was shown that the porous alumina promoted the growth of CsPbI3 film by absorbing the precursor and increasing the nucleation density. The prepared CsPbI3 film emitted strong and stable red light under ultraviolet light excitation at room temperature and ambient atmosphere. The lead iodide was absorbed on the surface of the porous alumina firstly then reacted with cesiumiodide to form the CsPbI3. The successful preparation of the CsPbI3 by the direct CVD method paves the way for its large scale growth and application in optoelectronic devices.

Energy-efficient condensation of steam contained in atmospheric air has emerged as a solution to the water scarcity. Academic and industrial research works that seeks to develop water collection devices with high efficiency has great relevance for the scientific community. In this work, we aim to show that modified carbon nanotubes forest can remove the condensed drops easier than a hydrophobic and a super-hydrophilic surface. In addition, this result was reached at high super saturation level which is an innovative aspect of this work. The Vertically Aligned Carbon Nanotubes (VACNTs) were grown on steel pipes. We used a CO2 laser and an O2 plasma to perform the post treatments that changed the CNTs to super-hydrophobic and super-hydrophilic, respectively. In addition, the CO2 laser treatment added a second level of roughness in the surface by etching the nanotubes walls. A polyethylene coating attached the carbon nanotubes to the substrate. We experimentally demonstrated a 24% higher vapor condensation rate at high supersaturations levels.

Carbon nanomaterials are consistently providing new excitement over their properties and potential applications, but many of these material have yet to fully live up to their expectations commercially. The barrier to adoption often exists as a result of complex processing, fragility of the as-produced material, or difficulty scaling beyond laboratory quantities. This work provides a new approach for utilizing fibrous carbon nanomaterials to advance the technology toward new applications and industrial utility. This is accomplished by creating tailored device architectures through in-situ integration of activated carbon powder using carbon nanofiber deposition. The resulting hybrid materials and components can serve in diverse applications, with each instance able to be fine-tuned through a combination of processing parameters. The applications of such materials are anticipated to directly serve current carbon-based technology in filtration, energy storage and delivery, and thermal management, but the concepts are not limited to current carbon applications.

CVD graphene growth typically uses commercially available cold-rolled copper foils, which includes a rich topography with scratches, dents, pits, and peaks. The graphene grown on this topography, even after annealing the foil, tends to include and reflect these topographic features. Further, the transfer of such CVD graphene to a flat substrate using a polymer transfer method also introduces wrinkles. Here, we examine an electropolishing technique for reducing native foil defects, characterize the resulting foil surface, grow single-crystal graphene on the polished foil, and examine the quality of the graphene for such defects.

It has been demonstrated that the introduction of NaCl can significantly improve the quality of monolayer WS2 at the growth temperatures ranging from 700°C to 850°C by atmospheric pressure chemical vapor deposition (APCVD) without the assistant of hydrogen. Here, the influence of NaCl on the nucleation and growth of WS2 has been thoroughly investigated. The morphology and quality of WS2 grown with different temperatures are discussed by optical microscope, Raman and Photoluminescence (PL) spectra. It was found that amount of NaCl can efficiently influence the morphology and quality of WS2 crystals. PL intensity of WS2 crystal increases around three times from the center region to the edge of an individual domain, which may be attributed to the appearance of small triangle hollows formed during the growth at the edge of single crystal WS2.

Either boron or nitrogen doped multilayered graphene was prepared by thermal chemical vapor deposition (CVD). Obtained heteroatom doped graphene was examined by Raman scattering, x-ray photo electron spectroscopy (XPS) and temperature dependence of sheet resistance. From the Raman scattering, obvious increase of ID/IG ratio could not be detected by boron doping, while it increased by ∼0.2 or more for nitrogen doped sample. From XPS, doping rates of boron and nitrogen were estimated to be in the range of 5∼12 at% and 1∼2 at%, respectively. XPS also showed that the boron and nitrogen atoms would locate at the doping sites of both graphitic and neighborhood of atomic defect. Magnitude of sheet resistance was decreased by either doping of boron or nitrogen.

Scalable synthesis of two-dimensional molybdenum disulfide (MoS2) via chemical vapor deposition (CVD) is of considerable interests for many applications in electronics and optoelectronics. Here, we investigate the CVD growth of MoS2 single crystals on sapphire substrates by using thermally evaporated molybdenum trioxide (MoO3) thin films as molybdenum (Mo) source instead of conventionally used MoO3 powder for co-evaporation synthesis. The MoO3 thin film source provides uniform Mo vapor pressure in the growth chamber resulting in clean and reproducible MoS2 triangles without any oxide or oxysulfide species. Scanning electron microscopy, Raman spectroscopy, photoluminescence spectroscopy and atomic force microscopy characterization were performed to characterize the growth results. Very high photoluminescence (PL) response was observed at 1.85 eV which is a good implication of high optical quality of these crystals directly grown on sapphire substrate.

Chemical vapor deposition (CVD) growth of two-dimensional molybdenum disulfide (MoS2) using molybdenum trioxide (MoO3) and sulfur (S) powder often results in intermediate molybdenum oxy-sulfide (MoOS2) species along with MoS2 due to a lack of control over the vapor pressure required for the clean growth. Much effort has been devoted in understanding and controlling of these intermediate MoOS2 specifies. Here, we show that with a second step sulfurization at moderate temperatures, these MoOS2 crystals can be transformed to monolayer MoS2 crystals. Scanning electron microscopy, Raman and photoluminescence spectroscopy and atomic force microscopy characterization carried out before and after re-sulfurization confirm the monolayer MoS2 growth via this route. This study shows that MoOS2 formed at the intermediate state can be successfully recycled to MoS2.