Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-11-26T13:01:18.454Z Has data issue: false hasContentIssue false
  • English
  • Français

Toward multiscale modeling of thin-film growth processes using SLKMC – ERRATUM

Published online by Cambridge University Press:  13 April 2018

Shree Ram Acharya  and
Talat S. Rahman

Abstract

An abstract is not available for this content. As you have access to this content, full HTML content is provided on this page. A PDF of this content is also available in through the ‘Save PDF’ action button.
Type
Erratum
Information
Journal of Materials Research , Volume 33 , Issue 7: Focus Issue: Advanced Atomistic Algorithms in Materials Science , 13 April 2018 , pp. 872
Copyright
Copyright © Materials Research Society 2018 

doi: 10.1557/jmr.2018.44, Published by Materials Research Society with Cambridge University Press, 28 March 2018.

The paper by Acharya and RahmanReference Archarya and Rahman1 was inadvertently published in Volume 33, Issue 6 of Journal of Materials Research. The article is part of the Journal of Materials Research Focus Issue on Advanced Atomistic Algorithms in Materials Science and is referenced as such in the introduction to that issue.Reference Martinez, Perz, Gavani and Kenny2

The publishers apologize for the error.

References

REFERENCES

Archarya, S.R. and Rahman, T.S.: Toward multiscale modeling of thin-film growth processes using SLKMC. J. Mater. Res. 33, 709–719 (2018). doi: 10.1557/jmr.2018.44.Google Scholar
Martinez, E., Perz, D., Gavani, V., and Kenny, S.: Introduction. J. Mater. Res. 33, 773–776 (2018). doi: 10.1557/jmr.2018.69.Google Scholar