We have accelerated the ageing of CuAlS2 by the application of
a static electrical field for different degradation times. We have
investigated the admittance spectroscopy and the scanning electron
microscopy to follow and understand the (mass-charge) coupled transport
processes produced in the volume and on the surface of these films. The
electrical constraint induces, after an incubation phase,
an activated decrease of the resistance, followed by a susbstantial
increase correlated to the formation of an open circuit. This
degradation occurs more rapidly for the films having
initially a lower resistance, due to the thermal dissipation which increases
considerably the temperature to about 140 °C. Admittance spectra
reveal, at low frequencies, a capacitive loop related to the
formation of a charge space induced by copper diffusion. Such migration
develop induces the formation of copper arborescences, spreading from the
cathode towards the anode. The effect of these
structures on the properties of the degraded films is discussed in relation
to electromigration and associated processes (whiskers, fracture, healing,
bridge-building, ...). Also, we have noticed their similarity with fractal
phenomena such as electrodeposition and dielectric breakdown.