Hostname: page-component-cd9895bd7-dzt6s Total loading time: 0 Render date: 2024-12-25T16:35:31.212Z Has data issue: false hasContentIssue false

Monte Carlo simulation of electron swarm parameters in O2

Published online by Cambridge University Press:  14 February 2007

A. Settaouti*
Affiliation:
Electrotechnic Department, University of Sciences and Technology, PO Box 1505 El-M'naouar, 31000 Oran, Algeria
L. Settaouti
Affiliation:
Electrotechnic Department, University of Sciences and Technology, PO Box 1505 El-M'naouar, 31000 Oran, Algeria
Get access

Abstract

Oxygen plasmas have found numerous applications in plasma processing, such as reactive sputtering, dry etching of polymers, oxidation, and resist removal of semiconductors. Swarm and transport coefficients are essential for better understanding and modelling of these gas discharge processes. The electron swarms in a gas under the influence of an electric field can be simulated with the help of a Monte Carlo method. The swarm parameters evaluated are compared with experimental results.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Brinkman, E.A., Stalder, K.R., Jeffries, J.B., J. Appl. Phys. 81, 1093 (1997) CrossRef
Goto, T., Hori, M., Jpn J. Appl. Phys. 35, 6521 (1996) CrossRef
Okamoto, S., Hishikawa, Y., Tsuda, S., Jpn J. Appl. Phys. 35, 26 (1996) CrossRef
de Urquijo, J., Plasma Sources Sci. T. 11, A86 (2002) CrossRef
Pinheiro, M.J., Loureiro, J., J. Phys. D: Appl. Phys. 35, 3077 (2002) CrossRef
Hernandez-Avila, J.L., Basurto, E., de Urquijo, J., J. Phys. D: Appl. Phys. 35, 2264 (2002) CrossRef
Pons, M., Pelletier, J., Joubert, O., Paniez, P., Jpn J. Appl. Phys. 34, 3723 (1995) CrossRef
Yoon, H.J., Chung, T.H., Korean, J., Phys. Soc. 39, 271 (2001)
Dall Armi, G., Fletcher, J., J. Phys. D: Appl. Phys. 36, 497 (2003) CrossRef
Descoeudres, A., Sansonnes, L., Hollenstein, Ch., Plasma Sources Sci. T. 12, 152 (2003) CrossRef
Moon, J.D., Geun, S.T., Lee, G.T., Park, D.K., Korean, J., Phys. Soc. 38, 680 (2001)
Chang, M.B., Balbach, J.H., Rood, M.J., Kushner, M.J., J. Appl. Phys. 69, 4409 (1991) CrossRef
Sardja, I., Dhali, S.K., Appl. Phys. Lett. 56, 21 (1990) CrossRef
Bogaerts, A., Gijbels, R., Goedheer, W., Jpn J. Appl. Phys. 38, 4404 (1999) CrossRef
Denpoh, K., Nanbu, K., Jpn J. Appl. Phys. 39, 2804 (2000) CrossRef
Nanbu, K., IEEE T. Plasma Sci. 28, 971 (2000) CrossRef
Kajita, S., Ushirata, S., Kondo, Y., J. Appl. Phys. 67, 4015 (1990) CrossRef
Liu, J., Govinda Raju, G.R., IEEE T. Elect. Ins. 28, 154 (1993) CrossRef
Jeon, B.-H., J. Korean Phys. Soc. 43, 513 (2003)
Dutton, J., J. Phys. Chem. Ref. Data. 4, 577 (1975) CrossRef
Al-Amin, S.A.J., Kucukarpaci, H.N., Lucas, J., J. Phys. D: Appl. Phys. 18, 1781 (1985) CrossRef
Hernandez-Avila, J.L., de Urquijo, J., J. Phys. D: Appl. Phys. 39, 647 (2006) CrossRef
E. Kuffel, M. Abdullah, High Voltage Engineering (Pergamon Press, London, 1978)
C. Soria, F. Pontiga, A. Castellanos, Conference on Electrical Insulation and Dielectric Phenomena 1999, pp. 437–440