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Surface structure and composition of nanocrystalline SnO2 thin films obtained by Chemical Vapor Deposition

Published online by Cambridge University Press:  15 March 2011

Davide Barreca
Affiliation:
ISTM-CNR and INSTM - Department of Chemical Sciences - Padova University- Via Marzolo, 1 - 35131 Padova, Italy
Elza Bontempi
Affiliation:
INFM and Structural Chemistry Laboratory – Department of Mechanical Engineering - Brescia University- Via Branze, 38 – 25123 Brescia, Italy
Laura E. Depero
Affiliation:
INFM and Structural Chemistry Laboratory – Department of Mechanical Engineering - Brescia University- Via Branze, 38 – 25123 Brescia, Italy
Cinzia Maragno
Affiliation:
Department of Chemical Sciences and INSTM - Padova University - Via Marzolo, 1 – 35131 Padova, Italy
Eugenio Tondello
Affiliation:
Department of Chemical Sciences and INSTM - Padova University - Via Marzolo, 1 – 35131 Padova, Italy
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Abstract

Nanocrystalline SnO2 thin films were synthesized by Chemical Vapor Deposition on Si(100) and Al2O3 substrates using bis(diethylamino)dimethylstannane(IV) [(CH3)2Sn(N(C2H5)2)2] as precursor. Film growth was performed at 400-500°C in an O2(H2O)+N2 atmosphere, with the aim of studying the effects of the synthesis conditions on the coating properties. The sample chemical composition and surface morphology were analyzed by X-ray Photoelectron Spectroscopy (XPS) and Atomic Force Microscopy (AFM), while their structural features were investigated by Glancing Incidence X-ray Diffraction (GIXRD) and X-ray Reflectivity (XRR). In this paper, the attention is focused on the interplay between film nanostructure and morphology, with particular regard to the influence of the growth surface.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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