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Submicron, Noble Metal Particle Reference Standards: A Proposal

Published online by Cambridge University Press:  15 February 2011

R. S. Hockett ,
Angela Y. Craig  and
Diem Le
R. S. Hockett
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063
Angela Y. Craig
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063
Diem Le
Affiliation:
Charles Evans & Associates, 301 Chesapeake Drive, Redwood City, CA 94063
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Abstract

There is a need in the semiconductor industry to develop new techniques and instrumentation for the elemental and chemical analysis of submicron, particularly <0.2 μm, particles. The development of these techniques and instrumentation could be assisted by submicron particle reference standards. We propose that high number-density, noble metal (Cu, Ag, Au) particles on silicon, with controlled diameters in the range of 0.02 μm to 0.10 μm, be developed and used as particle reference standards.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 386: Symposium O – Ultraclean Semiconductor Processing Technology and Surface , 1995 , 189
Copyright
Copyright © Materials Research Society 1995

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References

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