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Published online by Cambridge University Press: 21 March 2011
We demonstrate a novel technique for fabricating monolithically series connected solar modules from surface structured thin monocrystalline Si films that we prepare by layer transfer using porous Si (PSI process). The novel series connection technique bases on reactive ion etching of the silicon film in a microwave plasma prior and after layer transfer. The module has an area of 25 cm2 and consists of 5 unit cells that have a film thickness of 16 µm. We measure an open-circuit voltage of 3028 mV and a confirmed efficiency of 9.9%. The Si film has a randomly textured surface for light trapping.