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Silicon Nitride Fibers Using Micro Fabrication Methods

Published online by Cambridge University Press:  22 February 2011

J. Koskinen  and
H. H. Johnson
J. Koskinen
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853.
H. H. Johnson
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853.
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Abstract

Amorphous LPCVD and PECVD Si3N4 films have been patterned into fibers of various shapes using integrated circuit methods. A tensile test apparatus was developed which allows a simultaneous testing of up to 20 fibers. The average tensile strength of LPCVD Si3N4 fibers with a 30 μm gauge section was 7.0 ± 0.4 GPa. The corresponding value for PECVD Si3N4 was 2.4 ± 0.2 GPa. The following properties of the materials were measured: atomic composition (RBS, FRES), density, refractive index, internal stress, elastic modulus and micro hardness. A Weibull analysis of the tensile strength values was performed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 130: Symposium C – Thin Films: Stresses and Mechanical Properties I , 1988 , 63
Copyright
Copyright © Materials Research Society 1989

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