Hostname: page-component-586b7cd67f-2plfb Total loading time: 0 Render date: 2024-11-25T15:19:15.433Z Has data issue: false hasContentIssue false
  • English
  • Français

Ripple Pyrometry for Rapid Thermal Annealing

Published online by Cambridge University Press:  22 February 2011

A. T. Fiory  and
A.K. Nanda
A. T. Fiory
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill NJ 07974
A.K. Nanda
Affiliation:
AT&T Bell Laboratories, 555 Union Boulevard, Allentown PA 18102
Get access

Abstract

Ripple pyrometry was proposed by Accufiber as a method for measuring wafer temperature in lamp-heated ovens. The technique obtains the wafer temperature from the wafer emittance radiation by simultaneously determining the effective emittance of the wafer and suppressing the interference from reflected lamp radiation. This paper reviews the technique for rapid thermal annealing and presents experimental results on silicon wafers instrumented with thermocouples and on processing blanket-film monitor wafers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 342: Symposium G – Rapid Thermal and Integrated Processing III , 1994 , 3
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Schietinger, C., Adams, B., and Yarling, C., Mat. Res. Soc. Symp. Proc. 224, 23 (1991).CrossRefGoogle Scholar
[2] Fiory, A. T., Schietinger, C. S., Adams, B. A., and Tinsley, F. G., Mat. Res. Soc. Symp. Proc. 303, 139 (1993).CrossRefGoogle Scholar
[3] Knutson, K. L., private communication.Google Scholar
[4] Nanda, A. K., Wilkins, C. W., and Meester, S., This Symposium. Google Scholar