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Residual Stresses in Tungsten Lines: Analysis of Experimental- (Micro-Raman Spectroscopy, Xrd) and Numerical Results

Published online by Cambridge University Press:  15 February 2011

I. De Wolf ,
H.E. Maes ,
J. Moffet  and
M. Ignat
I. De Wolf
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
H.E. Maes
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
J. Moffet
Affiliation:
INP Grenoble BP75 Domaine Universitaire 38402 France
M. Ignat
Affiliation:
INP Grenoble BP75 Domaine Universitaire 38402 France
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Abstract

Micro-Raman spectroscopy, XRD, and analytical modelling are used to study stresses in and surrounding tungsten lines of different widths and spacing. The stress in the lines and in the adjacent substrate is calculated using a concentrated- and a distributed edge force model. Both models are adapted such that the substrate-stress components can also be calculated for an array of lines. The results from XRD and micro-Raman spectroscopy and the results from the distributed edge force model are in agreement. The combination of data from the two experimental techniques is shown to give some important feed-back to the theoretical models.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 391: Symposium T – Materials Reliability in Microelectronics V , 1995 , 109
Copyright
Copyright © Materials Research Society 1995

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References

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