Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-17T15:16:04.589Z Has data issue: false hasContentIssue false
  • English
  • Français

Residual Stress Analysis of Al Alloy Thin Films by X-Ray Diffraction as a Function of Film Thickness

Published online by Cambridge University Press:  22 February 2011

Carla J. Shute ,
J. B. Cohen  and
D. A. Jeannottea
Carla J. Shute
Affiliation:
Northwestern University, Department of Materials Science and Engineering, Evanston, IL 60208.
J. B. Cohen
Affiliation:
Northwestern University, Department of Materials Science and Engineering, Evanston, IL 60208.
D. A. Jeannottea
Affiliation:
IBM, IBM-U.S. Technology Products, Hopewell Junction, NY 12533.
Get access

Abstract

Residual stress has been measured as a function of layer thickness in thin films of an Al alloy on oxidized Si by the x-ray “d” versus sin2ψ technique. Samples with and without a passivation layer were examined. The results show an increase in residual stress with decreasing film thickness for the passivated samples and indicates that the interface between the metal film and SiO2 may be a region of high stress.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 130: Symposium C – Thin Films: Stresses and Mechanical Properties I , 1988 , 29
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kinosita, K., Thin Solid Films 12, 17 (1972).Google Scholar
2. Sinha, A. K. and Sheng, T. T., Thin Solid Films 48, 117 (1978).Google Scholar
3. Noyan, I. C. and Cohen, J. B., Residual Stress: Measurement by Diffraction and Interpretation, (Springer-Verlag New York Inc., 1987), p. 121.CrossRefGoogle Scholar
4. Winholtz, R. A. and Cohen, J. B., Aust. J. Phys. 41, 189 (1988).Google Scholar
5. Dolle, H., J. Appl. Cryst. 12, 489 (1979).CrossRefGoogle Scholar
6. Marion, R., Ph.D. Thesis, Northwestern University, Evanston IL (1972).Google Scholar
7. Noyan, I. C., Ph.D. Thesis, Northwestern University, Evanston IL (1984).Google Scholar
8. Noyan, I. C. and Nguyen, L. T. in Advances in X-ray Analysis, edited by Barrett, C. S., Gilfrich, J. V., Jenkins, R., Russ, J. C., Richardson, J. W. Jr. and Predecki, P. K. (Plenum Publishing Corporation 31, 1988) pp. 191–204.CrossRefGoogle Scholar
9. Noyan, I. C. and Nguyen, L. T., to be published in Volume 32 of Advances in X-ray Analysis.Google Scholar
10. James, M. R., Ph.D. Thesis, Northwestern University, Evanston IL (1977).Google Scholar