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Non-Destructive Electrical Techniques as Means for Understanding the Basic Mechanisms of Electromigration

Published online by Cambridge University Press:  25 February 2011

A. Scorzoni ,
I. De Munari  and
H. Stulens
A. Scorzoni
Affiliation:
CNR - Istituto LAMEL, via P. Gobetti 101, 40129 Bologna, Italy
I. De Munari
Affiliation:
Dipartimento di Ingegneria dell’Informazione, Università di Parma, v.le delle Scienze, 43100 Parma, Italy
H. Stulens
Affiliation:
Material Physics Division, Institute for Material Research (IMO), Limburg University Centre, B-3590 Diepenbeek, Belgium.
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Abstract

In this paper results of recently developed high resolution resistometric electromigration techniques will be described, with particular attention to the behaviour of narrow, near-bamboo metal lines. After a discussion on recent theoretical results published in the literature, a diffusion model correlating mechanical stress and electromigration will be adopted to describe experimental results of relative resistance change both during and after electromigration. The good agreement between experimental data and simulations must not hide that something must still be understood about the physical mechanism leading to resistance changes during electromigration experiments.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 337: Symposium B – Advanced Metallization for Devices and Circuits—Science, Technology and Manufacturing III , 1994 , 515
Copyright
Copyright © Materials Research Society 1995

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References

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