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A New X-Ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films

Published online by Cambridge University Press:  17 March 2011

Kazuhiko Omote  and
Shigeru Kawamura
Kazuhiko Omote
Affiliation:
X-Ray Research Laboratory, Rigaku Corp., Japan
Shigeru Kawamura
Affiliation:
Technology Development Center, Tokyo Electron Ltd., Japan
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Abstract

We have successively developed a new x-ray scattering technique for a non-destructive determination of pore-size distributions in porous low-κ thin films formed on thick substrates. The pore size distribution in a film is derived from x-ray diffuse scattering data, which are measured using offset θ/2θ scans to avoid strong specular reflections from the film surface and its substrate. Γ-distribution mode for the pores in the film is used in the calculation. The average diameter and the dispersion parameter of the Γ-distribution function are varied and refined by computer so that the calculated scattering pattern best matches to the experimental pattern. The technique has been used to analyze porous methyl silsesquioxane (MSQ) films. The pore size distributions determined by the x-ray scattering technique agree with that of the commonly used gas adsorption technique. The x-ray technique has been also used successfully determine small pores less than one nanometer in diameter, which is well below the lowest limit of the gas adsorption technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 714: Symposium – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics II , 2001 , L12.10.1
Copyright
Copyright © Materials Research Society 2001

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References

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