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Growth of Boron Nanowires by Chemical Vapor Deposition

Published online by Cambridge University Press:  01 February 2011

Li Guo  and
Raj N. Singh
Li Guo
Affiliation:
[email protected], University of Cincinnati, Chemical and Materials Engineering, 2624 Clifton Ave, Cincinnati, OH, 45221, United States
Raj N. Singh
Affiliation:
[email protected], University of Cincinnati, Cincinnati, OH, 45221, United States
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Abstract

Motivated by the extensive research on carbon nanotubes (CNTs), boron and its related nano-structures have attracted increasing interests for potential applications in nanodevices and nanotechnologies due to their extraordinary properties. B-related nanostructures are successfully grown on various substrates in a CVD process. The boron nanowires have diameters around 50-200 nanometers and lengths up to a few microns. The gas chemistry is monitored by the in-situ mass-spectroscopy, which helps to identify reactive species in the process. Modified vapor-solid growths as well as VLS growth mechanisms are proposed for the growth of these nanostructures. The role of the catalysts in the synthesis is also discussed.

Keywords

Bchemical vapor deposition (CVD) (deposition)machining
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1017 , 2007 , 1017-DD03-04-EE02-04
Copyright
Copyright © Materials Research Society 2007

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