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Fast Simulation of Pattern Formation and Process Dependencies in Roller Nanoimprint Lithography

Published online by Cambridge University Press:  23 January 2013

Hayden K. Taylor
Hayden K. Taylor*
Affiliation:
School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798.
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Abstract

We contribute a fast numerical approach to simulating the roller-imprinting of complex patterns. The technique predicts the extent to which imprinted patterns are fully formed, as well as variation of the imprinted material’s residual layer thickness (RLT). The approach can be used for roll-to-roll and roll-to-plate configurations, and for rollers with or without elastomeric coatings. If patterns vary in pitch, shape or areal density across the roller, RLT and the completeness of pattern transfer can vary with position as well as with processing parameters, and our technique is able to model these effects. The technique has been successfully validated against published experimental data from two different roller-NIL processes: one involving an ultraviolet-curing resist film on a glass plate, and another involving a flexible thermoplastic web softened at its surface.

Keywords

microstructurenanostructurepolymer
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1529: Symposium WW – Roll-to-Roll Processing of Electronics and Advanced Functionalities , 2012 , mrsf12-1529-ww02-05
Copyright
Copyright © Materials Research Society 2013

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References

REFERENCES

Taylor, H., ‘Simulation and Mitigation of Pattern and Process Dependencies in Nanoimprint Lithography’, Journal of Photopolymer Science and Technology, vol. 24, no. 1, pp. 47–55, 2011.CrossRefGoogle Scholar
Taylor, H., ‘Modeling and Controlling Topographical Nonuniformity in Micro- and Nano-Embossing’, PhD dissertation, Massachusetts Institute of Technology, 2009.Google Scholar
Taylor, H. and Boning, D., ‘Towards nanoimprint lithography-aware layout design checking’, presented at the Design for Manufacturability through Design-Process Integration IV, San Jose, California, USA, 2010, p. 76410U–76410U–12.CrossRefGoogle Scholar
Taylor, H., Lam, Y. C., and Boning, D., ‘A computationally simple method for simulating the micro-embossing of thermoplastic layers’, Journal of Micromechanics and Microengineering, vol. 19, no. 7, p. 075007, 2009.CrossRefGoogle Scholar
Taylor, H., Cheong Lam, Yee, and Boning, D., ‘An investigation of the detrimental impact of trapped air in thermoplastic micro-embossing’, Journal of Micromechanics and Microengineering, vol. 20, no. 6, p. 065014 (12 pp.), Jun. 2010.CrossRefGoogle Scholar
Taylor, H., Smistrup, K., and Boning, D., ‘Modeling the enhancement of nanoimprint stamp bending compliance by backside grooves: mitigating the impact of wafer nanotopography on residual layer thickness’, presented at Nanoimprint and Nanoprint Technology, Copenhagen, 2010.Google Scholar
Taylor, H., Smistrup, K., and Boning, D., ‘Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity’, Microelectronic Engineering, vol. 88, no. 8, pp. 2154–2157, Aug. 2011.CrossRefGoogle Scholar
Taylor, H. and Wong, E., ‘Fast simulation of nanoimprint lithography: modeling capillary pressures during resist deformation’, presented at Nanoimprint and Nanoprint Technology, Jeju, Korea, 2011.Google Scholar
Ahn, S. H. and Guo, L. J., ‘Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting’, ACS Nano, vol. 3, no. 8, pp. 2304–2310, 2009.CrossRefGoogle ScholarPubMed
Taylor, H., Hale, M., Cheong Lam, Yee, and Boning, D., ‘A method for the accelerated simulation of micro-embossed topographies in thermoplastic polymers’, Journal of Micromechanics and Microengineering, vol. 20, no. 6, p. 065001 (11 pp.), Jun. 2010.CrossRefGoogle Scholar
Johnson, K. L., Contact Mechanics. Cambridge, 1985.CrossRefGoogle Scholar
Ahn, S. H. and Guo, L. J., ‘High-Speed Roll-to-Roll Nanoimprint Lithography on Flexible Plastic Substrates’, Advanced Materials, vol. 20, no. 11, pp. 2044–2049, 2008.CrossRefGoogle Scholar
Mäkelä, T., Haatainen, T., and Ahopelto, J., ‘Roll-to-roll printed gratings in cellulose acetate web using novel nanoimprinting device’, Microelectron. Eng., vol. 88, no. 8, pp. 2045–2047, Aug. 2011.CrossRefGoogle Scholar
Ulsh, M. J., Strobel, M. A., Serino, D. F., and Keller, J. T., Embossed optical polymer films. U.S. Patent 6,096,247, 2000.Google Scholar