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Fabrication of Three-Dimensional Photonic Crystal by Wafer Fusion Approach

Published online by Cambridge University Press:  21 March 2011

Noritsugu Yamamoto
Affiliation:
Research Institute of Photonics, National Institute of Advanced Industrial Science and Technology, AIST Tsukuba Central 2, 1-1-1, Umezono, Tsukuba 303-8568, Japan
Katsuhiro Tomoda
Affiliation:
Dept. of Electronic Science and Engineering, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto 606-8501, Japan
Susumu Noda
Affiliation:
Dept. of Electronic Science and Engineering, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto 606-8501, Japan Core Research for Evolution Science and Technology (CREST), Japan Science and Technology Corporation (JST)
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Abstract

Based on a set of requirements identified for photonic crystals intended for use in optoelectronic devices, we have developed a method of fabricating three-dimensional photonic crystals that involves stacking air/semiconductor gratings by wafer fusion approach. Precise alignment of the stacked layers is achieved through the use of a laser beam assisted very precise alignment system, and three-dimensional photonic crystal has been successfully fabricated for the infrared and optical communication wavelength regions. We have also developed a photonic crystal waveguide providing sharp 90° bend.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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