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Evaluation of No-Clean Fluxes for High Reliability Applications
Published online by Cambridge University Press: 21 February 2011
Abstract
A series of rosin mildly activated, halide free, low residue fluxes have been evaluated for use with hot bar reflow of Tape Carrier Packages (TCP) to printed circuit boards (PCB). Materials were studied with respect to their wettability, SIR performance, water reflux extractable ionics and residue levels. Ionic levels were measured by FTIR and Ion chromatography. A flux was selected which has demonstrated acceptable performance in 156C/85%RH 10V biased stress testing.
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- Research Article
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- Copyright © Materials Research Society 1995
References
REFERENCES
1
Vardaman, J., ed., Surface Mount Technology: Recent Japanese Developments, IEEE Press, New York, 1992.Google Scholar
2
Kearns, R.
et al. , “Switching to a no-clean process…,” in Proc. Nepcon West, Anaheim CA, Feb. 26 - March 1, 1995, pp. 1867.Google Scholar
3
Maguire, J., “Evaluation of water soluble fluxes…,” in Proc. Nepcon West, Anaheim CA, Feb. 26 - March 1, 1995, pp.843–864.Google Scholar
4
Scheifers, S. and Raleigh, C., “FCOB process characterization,” in Proc. of the 15th IEEE/CHMT International Electronics Manufacturing Technology Symposium, Santa Clara, CA, Oct. 4–6, 1993, p143.Google Scholar
5
Manko, H., Soldering Handbook for Printed Circuits and Surface Mounting, Van Nostrand Reinhold, New York, 1986.Google Scholar
6
Prasad, R., Surface Mount Technology: Principles and Practice, Van Nostrand Reinhold, New York, 1989.Google Scholar
7
Adams, K.
et al. , “No clean flux residue detection: Optimization of extraction/ion chromatography,” in Proc. of Surface Mount International, San Jose, CA, Aug. 28- Sept.1, 1994, p381.Google Scholar
8
Vaughan, R.,: Use of a low residue flux in a military electronics program,” in Proc. Nepcon West, Anaheim CA, Feb. 26 - March 1, 1995, pp. 1857–1867.Google Scholar
9
Leonard, J., “Experimental techniques for down selecting materials and determining critical process parameters in the development of no clean soldering processes,” in Proc. of Surface Mount International, San Jose, CA, Aug. 28-Sept. 1, 1994, p102Google Scholar
10
Welch, C.S., “Feasibility study of OSEE inspection for flux residue on electronics assemblies,” in Proc. of Surface Mount International, San Jose, CA, Aug. 28-Sept. 1, 1994, p375.Google Scholar
11
Sohn, J. and Ray, U., “How clean is clean,” in Proc. of Surface Mount International, San Jose, CA, Aug. 28-Sept. 1, 1994, p391.Google Scholar
12
Jozefowicz, M., and NC Lee, “Flux reliability assessment: Electromigration vs. SIR,” in Proc. Nepcon West, Anaheim CA, Feb. 7–11, 1993, pp.1316–1324.Google Scholar
13
Ellis, B., “Ionic Conduction and Flux Residue Safety” in Proc. IPC Fall Meeting Oct. 24–28, 1993, Washington DC.,Google Scholar
14
Gudul, H. and Schrantz, J., “A flux selection methodology…,” in Proc. Nepcon West, Anaheim CA, Feb. 26 - March 1, 1995, pp.409–420.Google Scholar
15
Brownell, P. and Lindig, D., “An automated low solids flux concentration analyzer,” in Proc. of the 15th IEEE/CHMT International Electronics Manufacturing Technology Symposium, Santa Clara, CA, Oct. 4–6, 1993, p141.Google Scholar
16
Lau, J.
et al. , “Reliability of 0.4mm pitch 256 pin plastic quad flat package with noclean and water cleaned solder joints.” in Proc. of the 43th IEEE/CHMT Electronics Component Technology Conference, Buena Vista FL, June. 1–4, 1993, p39–53.Google Scholar
17
Szymanowski, R., “No clean solder enhancements,” in Proc. Nepcon West, Anaheim CA, Feb. 7–11, 1993, pp.563.Google Scholar
18
Brownell, P., “No Clean no residue technology,” in Proc. Nepcon West, Anaheim CA, Feb. 7–11, 1993, pp.533.Google Scholar
19
Hoge, C., “Corrosion Criteria for Electronic Packaging”, IEEE Trans. on CHMT, 13, no.4, pp1090–1109, Dec. 1990.Google Scholar