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Direct Surface Analysis of Organic Contamination for Semiconductor Related Materials

Published online by Cambridge University Press:  15 February 2011

J. Lee ,
R. W. Odom ,
G. S. Strossman  and
P. M. Lindley
J. Lee
Affiliation:
Charles Evans and Associates, 301 Chesapeake Drive, Redwood City, CA 94063
R. W. Odom
Affiliation:
Charles Evans and Associates, 301 Chesapeake Drive, Redwood City, CA 94063
G. S. Strossman
Affiliation:
Charles Evans and Associates, 301 Chesapeake Drive, Redwood City, CA 94063
P. M. Lindley
Affiliation:
Charles Evans and Associates, 301 Chesapeake Drive, Redwood City, CA 94063
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Abstract

Direct surface analysis of Si wafers and environmental materials such as polymers for wafer carriers and for high purity water systems is important to identify contaminants and their sources. Organic contaminants on the surfaces are difficult to analyze; however, their adverse effects have been cited in recent years. This paper demonstrates the detection and identification of surface contaminants using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) on semiconductor related materials. The analytical information provided by TOF-SIMS can be useful for maintaining material cleanliness or for failure analysis.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 386: Symposium O – Ultraclean Semiconductor Processing Technology and Surface , 1995 , 143
Copyright
Copyright © Materials Research Society 1995

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References

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