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Cu-Compatible Ultra-High Permittivity Dielectrics for Embedded Passive Components

Published online by Cambridge University Press:  01 February 2011

Jon F. Ihlefeld
Affiliation:
Institute for Electroceramic Thin Films, Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695
Angus I. Kingon
Affiliation:
Institute for Electroceramic Thin Films, Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695
William Borland
Affiliation:
DuPont Electronic Technologies, Research Triangle Park, NC 27709
Jon-Paul Maria
Affiliation:
Institute for Electroceramic Thin Films, Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695
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Abstract

Barium titanate thin films have been prepared by chemical solution deposition on 18 μm thick, industry standard copper foils in the absence of chemical barrier layers. The final embodiment exhibits randomly oriented BaTiO3 grains with diameters between 0.1 and 0.2 μm, and an equiaxed morphology. The average film thickness is 0.6 μm and high resolution cross sectional microscopy shows no indication of interfacial phases. The BaTiO3 films are sintered in a high temperature reductive atmosphere such that copper oxidation is avoided. Subsequent lower-temperature, higher oxygen pressure anneals are used to minimize oxygen point defects. Permittivities greater than 3000 are observed, with loss tangents under 2.5%. The BaTiO3 phase exhibits pronounced ferroelectric switching and coercive field values near 20 kV/cm. Temperature dependent measurements indicate a ferroelectric transition near 100 °C with very diffuse character. Combining the approaches of the multilayer capacitor industry with traditional solution processed thin films has allowed pure barium titanate to be integrated with copper. The high sintering temperature – as compared to typical film processing – provides for large grained films and properties consistent with well-prepared ceramics. Integrating BaTiO3 films on copper foil represents an important step towards high capacitance density embedded passive components.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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