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Published online by Cambridge University Press: 25 February 2011
Ellipsometry in combination with X-ray fluorescence spectroscopy is demonstrated as a suitable technique to characterize SiGe thin films (180–800 Å) rapidly and nondestructively. Film thickness values extracted from ellipsometry are in agreement with the measurements obtained using other techniques such as TEM, SIMS, and RBS. The measured Ge concentration obtained by direct excitation of X-rays in several SiGe films ranging from 6 to 20 atomic percent, shows good correlation with the values obtained using RBS and SIMS.