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Characterization By Variable Angle Spectroscopic Ellipsometry Of Dielectric Columnar Thin Films Produced By Glancing Angle Deposition

Published online by Cambridge University Press:  01 February 2011

James Gospodyn ,
Michael J. Brett  and
Jeremy C. Sit
James Gospodyn
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada
Michael J. Brett
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada
Jeremy C. Sit
Affiliation:
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada
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Abstract

Thin films composed of MgF2 and TiO2 were grown by glancing flux incidence, where the physical vapor flux arrives at the substrate between 80° and 90° with respect to substrate normal. The resulting films are composed of slanted columns inclined toward the incoming flux. The films were modeled using the Bruggemann effective medium approximation (EMA) and were found to be biaxial with one of the principal indices of refraction along the direction of the posts. The indices of refraction for MgF2 and TiO2 films were found to be in the range of 1.06 to 1.2 and 1.36 to 1.62, respectively, at a wavelength of 600 nm. The indices of refraction were found to decrease as the deposition angle increased. The film density was also found to be independent of the film thickness for films ranging in thickness from 500 nm to 3400 nm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 797: Symposium W – Engineered Porosity for Microphotonics and Plasmonics , 2003 , W5.19
Copyright
Copyright © Materials Research Society 2004

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References

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