We describe a mass transport TCAD simulation by using a Sentaurus S-Interconnect tool [1] that models reported electro-migration (EM) behaviors: EM induced resistance (R) change, line length (L) effect, and temperature (T) dependency on L and current density (j) products. We performed trend and sensitivity analyses for key physical EM model parameters: Cu-void formation, a sudden jump in line R associated with void growth, and Cu-vacancy (Cv) and void (Cvoid) profiles. In this manner, we develop a new methodology for accurately determining the EM lifetime by identifying an “EM-aware” region to define the L dependence of Cu-lines under high current stress. This includes electron flow dependency to explain line and via depletion effects for void formations under various stress conditions. We report a non-linearity in the L dependence on the jL product and a slight temperature dependence on the Blech Threshold (jL)c.