Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-06T13:05:03.314Z Has data issue: false hasContentIssue false
  • English
  • Français

Temperature Estimation and Precision Control of RTP Systems by Multi-Zone Lamp Interference and Wafer Emissivity Compensation I: Model Identification

Published online by Cambridge University Press:  10 February 2011

Sergey Belikov ,
Jalil Kamali ,
Yong Jin Lee  and
Mehrdad Moslehi
Sergey Belikov
Affiliation:
New Jersey Institute of Technology, Newark, NJ
Jalil Kamali
Affiliation:
CVC Products, Fremont, CA
Yong Jin Lee
Affiliation:
CVC Products, Fremont, CA
Mehrdad Moslehi
Affiliation:
CVC Products, Fremont, CA
Get access

Abstract

RTP temperature measurement using conventional pyrometric technique has serious limitations such as uncertainty of emissivity, lamp interference, and window/chamber heating effect. In this paper, we propose to compensate for these effects using a real-time computational algorithm based on physical model of pyrometric detectors and wafer temperature dynamics. We consider an RTP system for processing 200 mm wafers with five circular zones of heating lamps and ten pyrometric sensors, five of which measure the radiation from five optically isolated dummy lamps and the rest measure the radiation of the wafer back side at different radial positions. Thermocouple measurements are also used to identify the model parameters. Part I of the paper is concerned with modeling and parameter identification.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 470: Symposium F – Rapid Thermal and Integrated Processing IV , 1997 , 91
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Moslehi, M., Lee, Y.J., Schaper, C., Omstead, T., Velo, L., Kermani, A., and Davis, C., in Advances in Rapid Thermal and Integrated Processes, (ed. Roozeboom, F.), Kluwer Acad. Publisher, 1996.Google Scholar
2. Friedland, B., Advanced Control System Design, Prentice Hall, Englewood Cliffs, NJ, 1996.Google Scholar
3. Mracek, C., Cloutier, J., and D'Souza, A., in Proc.5th IEEE Conf.on Control Applications. 1996.Google Scholar
4. Belikov, S., Kaplinsky, M., and Friedland, B., in Proc.1995 American Control Conf. 1995.Google Scholar