Hostname: page-component-586b7cd67f-2brh9 Total loading time: 0 Render date: 2024-11-25T16:25:27.939Z Has data issue: false hasContentIssue false
  • English
  • Français

Reflective Infrared Spectra of PECVD Thin Films on Glass Substrate

Published online by Cambridge University Press:  10 February 2011

Shusheng He
Shusheng He*
Affiliation:
Sharp Microelectronics Technology Inc. 5700 NW Pacific Rim Blvd., Camas, WA 98607
Get access

Abstract

In order to use a reflective FTIR measurement to evaluate thin films deposited on glass substrate, we have to consider several important factors, such as surface polarization, phase shift, and interference from different interfaces. PECVD thin films, oxide, nitride and a-Si:H deposited on top of the glass substrate are discussed by the reflective FTIR measurement.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 508: Symposium B – Flat Panel Display Materials - 1998 , January 1998 , 127
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Hanyaloglu, B. F., Aydil, E.S., 44' AVS Abstract, p.19.Google Scholar
[2] Meyer-Arendt, J. R., Introduction to Classical &Modern Optics, Third Edition, Prentice-Hall.Google Scholar
[3] Wong, J. and Yen, Y., Applied Spectroscopy, Volume 42, No. 4, 1988, p. 598.Google Scholar
[4] French, I.D., Properties ofAmorphous Silicon, 2nd Edition, EMIS Datareviews Series No. 1, p. 122.Google Scholar
[5] Lucovsky, G., Nemanich, R.J., Knights, J.C., Phys. Rev. B. 19, 2064–73, 1979.Google Scholar