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Improved a-Si:H TFT Performance Using a-SixN1-x / a-SixC1-x Stack Dielectrics
Published online by Cambridge University Press: 10 February 2011
Abstract
In this paper we present a study on the electrical characteristics (conductivity, σ and relative dielectric constant, εr,.) of amorphous silicon nitride (a-SixN1-x) and carbide (a-SixC1-x) films deposited by PECVD, used as dielectric materials in TFT devices, aiming to select the most adequate alloy that lead to improve device performances. Besides that, double stack a-SixN1-x/a-SixC1-x structures were developed and applied as dielectric layers on TFTs, whose performances show to be superior to those ones using single silicon nitride or silicon carbide as dielectric.
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- Copyright © Materials Research Society 1997
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