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Flexible Optical Interconnects via Thiol-ene Two-photon-induced Polymerization

Published online by Cambridge University Press:  09 August 2012

Josef Kumpfmueller
Affiliation:
Institute for Applied Synthetic Chemistry, Lehargasse 2-6, A-1060-Vienna, Austria
Klaus Stadlmann
Affiliation:
Institute of Material Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, A-1040-Vienna, Austria
Zhiquan Li
Affiliation:
Institute for Applied Synthetic Chemistry, Lehargasse 2-6, A-1060-Vienna, Austria
Valentin Satzinger
Affiliation:
MATERIALS-Institute for Surface Technology and Photonics, Joanneum Research, Franz-Pichler-Strasse 30, A-8160-Weiz, Austria
Juergen Stampfl
Affiliation:
Institute of Material Science and Technology, Vienna University of Technology, Favoritenstrasse 9-11, A-1040-Vienna, Austria
Robert Liska
Affiliation:
Institute for Applied Synthetic Chemistry, Lehargasse 2-6, A-1060-Vienna, Austria
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Abstract

Two-photon polymerization (2PP) is an emerging tool in the field of additive manufacturing technologies, which allows for the elegant 3D lithographic production by means of photosensitive resins. One key advantage of 2PP is the achievable feature resolution. A few tens of nanometers are currently the resolution limit for this novel technique. Fields of applications are as diverse as photonics, microfluidics and biomedicine.

A challenging photonics application for 2PP are optical interconnects, where optical elements on printed circuit boards are connected with waveguides. The possibility for real 3D structuring allows for easier positioning of the cured structures and straightforward processing outperforming techniques such as 2D lithography or reactive ion etching in this regard. If mechanical flexibility of the printed circuit board is required as a property for certain niche applications, polysiloxanes are an interesting class of matrix material. This is also due to their low optical damping behavior and high temperature stability as the material has to withstand temperatures around 250°C during the manufacturing process. In this work, we present our latest approach to create polysiloxane-based waveguides via 2PP of specially tailored thiol-ene formulations. Latest improvements on the ease of processing and the local refractive index increase are shown as well as the proof of principle for waveguiding. Optical waveguides were successfully created via 2PP with writing speeds around 10 mm/min.

Type
Articles
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

1. Watanabe, T.; Ooba, N.; Hayashida, S.; Kurihara, T.; Imamura, S. Journal of Lightwave Technology 1998, 16, (6), 10491055.Google Scholar
2. Houbertz, R.; Domann, G.; Cronauer, C.; Schmitt, A.; Martin, H.; Park, J. U.; Frohlich, L.; Buestrich, R.; Popall, M.; Streppel, U.; Dannberg, P.; Wachter, C.; Brauer, A. Thin Solid Films 2003, 442, (1,2), 194200.Google Scholar
3. Oubaha, M.; Copperwhite, R.; Gorin, A.; Purlys, V.; Boothman, C.; O’Sullivan, M.; Gadonas, R.; McDonagh, C.; MacCraith, B. D. Applied Surface Science 257, (7), 29952999.Google Scholar
4. Miura, K.; Qiu, J.; Inouye, H.; Mitsuyu, T.; Hirao, K. Applied Physics Letters 1997, 71, (23), 33293331.Google Scholar
5. Ishihara, J.; Komatsu, K.; Sugihara, O.; Kaino, T. Applied Physics Letters 2007, 90, (3), 033511/1033511/3.Google Scholar
6. Woods, R.; Feldbacher, S.; Langer, G.; Satzinger, V.; Schmidt, V.; Kern, W. Polymer 52, (14), 30313037.Google Scholar
7. Krivec, S.; Matsko, N.; Satzinger, V.; Pucher, N.; Galler, N.; Koch, T.; Schmidt, V.; Grogger, W.; Liska, R.; Lichtenegger, H. C. Advanced Functional Materials 20, (5), 811819.Google Scholar
8. Infuehr, R.; Pucher, N.; Heller, C.; Lichtenegger, H.; Liska, R.; Schmidt, V.; Kuna, L.; Haase, A.; Stampfl, J. Applied Surface Science 2007, 254, (4), 836840.Google Scholar
9. Kumpfmueller, J.; Stadlmann, K.; Satzinger, V.; Li, Z.; Stampfl, J.; Liska, R. Journal of Laser Micro/Nanoengineering 6, (3), 195198.Google Scholar
10. Schmidt, V.; Kuna, L.; Satzinger, V.; Houbertz, R.; Jakopic, G.; Leising, G. Proceedings of SPIE-The International Society for Optical Engineering 2007, 6476, (Optoelectronic Integrated Circuits IX), 64760P/164760P/9.Google Scholar