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Energy Levels of Defects in a-Si:H From Optical and Electrical Characteristics

Published online by Cambridge University Press:  10 February 2011

T. Globus
T. Globus*
Affiliation:
EE Department, University of Virginia, Charlottesville, VA 22903, [email protected]
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Abstract

Two novel characterization techniques for hydrogenated silicon thin films have been recently proposed which show promise in providing critical feedback for evaluating materials and monitoring the device fabrication process. The first technique is the optical interference spectroscopy for a quick non-destructive measurement of absorption coefficient and refractive index spectra of amorphous- and poly-Si thin films in a wide range of the incident photon energies (0.5–3.5 eV) [1]. By using this technique, the absorption related to defects in the subgap energy region has been determined for device quality thin films. The second technique is the novel version of the field effect conductivity (FEC) method for the direct density-of-states (DOS) determination from analysis of thin film transistor (TFT) quasi-static transfer characteristics [2]. This sensitive, fast, and easy to use, method makes it possible to resolve fine-scale features in the midgap DOS of a-Si:H. In this work, data from two methods of spectroscopy are analyzed together. Very close correlation of results is demonstrated which provides a unique opportunity to identify midgap defect states and to understand the fundamental physics of hydrogenated silicon films. The energy map of defect states in the upper half of a-Si:H bandgap is presented. These results permits to use TFT transfer characteristics and optical interference technique measurements as effective tools to control the quality of TFF manufacturing process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 424: Symposium H – Flat Panel Display Materials II , 1996 , 97
Copyright
Copyright © Materials Research Society 1997

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