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Contact pattern sensitivity and precision machine control in roll-to-roll microcontact printing

Published online by Cambridge University Press:  15 February 2013

Joseph E. Petrzelka ,
Melinda R. Hale  and
David E. Hardt
Joseph E. Petrzelka
Affiliation:
Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139, U.S.A.
Melinda R. Hale
Affiliation:
Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139, U.S.A.
David E. Hardt
Affiliation:
Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139, U.S.A.
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Abstract

Scaling contact lithography (microcontact printing, microflexography, and nanoimprint lithography) to large roll-to-roll platforms will enable high speed, low cost lithographic patterning of surfaces. However, many details of robust implementations at the roll-to-roll scale remain an engineering challenge, including precise regulation of printing pressures and the stamp-substrate interaction. This paper introduces a method for precise control of contact pressure that can accommodate large dimensional variations, i.e. varying stamp and substrate thicknesses. This control algorithm is implemented on a simply supported roll positioning stage. Experimental results for microcontact printing and microflexography are shown both with in situ contact measurements on a pseudo substrate and with 5 um silver nanoparticle prints. Ultimately, this approach enables robust printing despite sensitive stamp patterns and large dimensional variations (> 10 μm) in substrates, stamps, and roll equipment.

Keywords

lithography (deposition)nanoscaletransparent conductor
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1529: Symposium WW – Roll-to-Roll Processing of Electronics and Advanced Functionalities , 2012 , mrsf12-1529-ww03-06
Copyright
Copyright © Materials Research Society 2013

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References

REFERENCES

Petrzelka, J.E. and Hardt, D.E. “Static load-displacement behavior of PDMS microfeatures for soft lithography.” Journal of Micromechanics and Microengineering, 2012, 22:075015.CrossRefGoogle Scholar
Hui, C.Y., Jagota, a., Lin, Y.Y., and Kramer, E.J.. “Constraints on Microcontact Printing Imposed by Stamp Deformation.” Langmuir, 18(4):1394–1407, 2002.CrossRefGoogle Scholar
Petrzelka, J.E. and Hardt, D.E. “Roll based soft lithography: stamp contact mechanics and process sensitivity, ” ASME Journal of Manufacturing Science and Engineering (final review).Google Scholar
Petrzelka, J.E. and Hardt, D.E. “Design, characterization, and control of a parallel kinematic stage for precision roll based manufacturing.” Submitted to Precision Engineering.Google Scholar
Petrzelka, J.E. and Hardt, D.E. “Continuous Contact Control for Microcontact Printing using Precision Position Stage with Optical Feedback.” ASPE 2011 Annual Meeting, Denver, CO, 2011.Google Scholar
Petrzelka, J.E. “Contact region fidelity, sensitivity, and control in roll-based soft lithography.” PhD Thesis, Massachusetts Institute of Technology, 2012.Google Scholar
Ahn, S.H. and Guo, L.J.. “Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting.” ACS Nano, 3(8):2304–2310, 2009.CrossRefGoogle ScholarPubMed