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Mechanism-based design of precursors for focused electron beam-induced deposition

Published online by Cambridge University Press:  26 April 2018

Will G. Carden
Affiliation:
Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, USA
Hang Lu
Affiliation:
Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, USA
Julie A. Spencer
Affiliation:
Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, USA Department of Chemistry, United States Naval Academy, Annapolis, Maryland 21402, USA
D. Howard Fairbrother
Affiliation:
Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, USA
Lisa McElwee-White*
Affiliation:
Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, USA
*
Address all correspondence to Lisa McElwee-White at [email protected]
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Abstract

Focused electron beam-induced deposition (FEBID) is capable of producing metal-containing nanostructures with lateral resolution on the sub-nanometer scale. Practical application of this nanofabrication technique has been hindered by ligand-derived contamination from precursors developed for thermal deposition methods. Mechanistic insight into FEBID through surface science studies and gas-phase electron–molecule interactions has begun to enable the design of custom FEBID precursors. These studies have shown that precursors designed to decompose under electron irradiation can produce high-purity FEBID deposits. Herein, we highlight the progress in FEBID precursor development with several examples that incorporate this mechanism-based design approach.

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Prospective Articles
Copyright
Copyright © Materials Research Society 2018 

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