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Can fluorine-doped tin Oxide, FTO, be more like indium-doped tin oxide, ITO? Reducing FTO surface roughness by introducing additional SnO2 coating

Published online by Cambridge University Press:  28 August 2018

David A. Keller ,
Hannah-Noa Barad ,
Eli Rosh-Hodesh ,
Arie Zaban  and
David Cahen
David A. Keller*
Affiliation:
Department of Chemistry, Center for Nanotechnology & Advanced Materials, Bar Ilan University, 5290002 Ramat Gan, Israel
Hannah-Noa Barad
Affiliation:
Department of Chemistry, Center for Nanotechnology & Advanced Materials, Bar Ilan University, 5290002 Ramat Gan, Israel
Eli Rosh-Hodesh
Affiliation:
Department of Chemistry, Center for Nanotechnology & Advanced Materials, Bar Ilan University, 5290002 Ramat Gan, Israel
Arie Zaban
Affiliation:
Department of Chemistry, Center for Nanotechnology & Advanced Materials, Bar Ilan University, 5290002 Ramat Gan, Israel
David Cahen
Affiliation:
Department of Chemistry, Center for Nanotechnology & Advanced Materials, Bar Ilan University, 5290002 Ramat Gan, Israel
*
Address all correspondence to David A. Keller at [email protected]
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Abstract

Among the commercially common transparent conducting oxides (TCOs) are fluorine-doped tin oxide (FTO) and indium-doped tin oxide (ITO), neither of which meets all criteria for the optimal TCO. Despite its superior chemical stability and being composed of abundant elements, FTO suffers from high surface roughness compared to ITO. Here, we introduce a path to substantially decrease the surface roughness of FTO, while preserving most of its original advantages, by depositing an SnO2 coating on top of the FTO layer using pulsed laser deposition. Such an enhancement may allow future use of FTO in devices that use now the more expensive, less stable ITO, which contains relatively rare indium.

Type
Research Letters
Information
MRS Communications , Volume 8 , Issue 3 , September 2018 , pp. 1358 - 1362
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Copyright
Copyright © Materials Research Society 2018 

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References

1.Ginley, D.S. and Bright, C.: Transparent conducting oxides. MRS Bull. 25, 15 (2000).Google Scholar
2.Barquinha, P., Martins, R., Pereira, L., and Fortunato, E.: Transparent Oxide Electronics: From Materials to Devices (Wiley, West Sussex, United Kingdom, 2012).Google Scholar
3.Hosono, H. and Ueda, K.: Transparent conductive oxides. In Springer Handbook of Electronic and Photonic Materials, edited by Kasap, S. and Capper, P. (Springer International Publishing, Cham, 2017), pp. 1.Google Scholar
4.Löbmann, P.: Transparent conducting oxides, in chemical solution deposition of functional oxide thin films, edited by Schneller, T., Waser, R., Kosec, M. and Payne, D. (Springer Vienna, Vienna, 2013), pp. 655.Google Scholar
5.Ingram, B.J., Gonzalez, G.B., Kammler, D.R., Bertoni, M.I., and Mason, T.O.: Chemical and structural factors governing transparent conductivity in oxides. J. Electroceram. 13, 167 (2004).Google Scholar
6.Pasquarelli, R.M., Ginley, D.S., and O'Hayre, R.: Solution processing of transparent conductors: from flask to film. Chem. Soc. Rev. 40, 5406 (2011).Google Scholar
7.Wu, C.C., Wu, C.I., Sturm, J.C., and Kahn, A.: Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic light emitting devices. Appl. Phys. Lett. 70, 1348 (1997).Google Scholar
8.Sohn, M.H., Kim, D., Kim, S.J., Paik, N.W., and Gupta, S.: Super-smooth indium–tin oxide thin films by negative sputter ion beam technology. J. Vac. Sci. Technol A 21, 1347 (2003).Google Scholar
9.Rey, G., Ternon, C., Modreanu, M., Mescot, X., Consonni, V., and Bellet, D.: Electron scattering mechanisms in fluorine-doped SnO2 thin films. J. Appl. Phys. 114, 183713 (2013).Google Scholar
10.Hongli, Z., John, K., Cesar, P., and Jingkai, Y.: Oxygen distribution of fluorine-doped tin oxide films coated on float glass along depth before and after heat treatment. Int. J. Appl. Glass. Sci. 4, 242 (2013).Google Scholar
11.Kim, Y.-N., Shin, H.-G., Song, J.-K., Cho, D.-H., Lee, H.-S., and Jung, Y.-G.: Thermal degradation behavior of indium tin oxide thin films deposited by radio frequency magnetron sputtering. J. Mater. Res. 20, 1574 (2005).Google Scholar
12.King, P.D.C. and Veal, T.D.: Conductivity in transparent oxide semiconductors. J. Phys.: Condens. Matter 23, 334214 (2011).Google Scholar
13.Wang, J.T., Zhong, X.H., and Wang, J.N.: Significant roughness enhancement of fluorine-doped tin oxide films with low resistivity and high transparency by using HNO3 addition. RSC Adv. 5, 52174 (2015).Google Scholar
14.Shi, X.L., Wang, J.T., and Wang, J.N.: Roughness improvement of fluorine-doped tin oxide thin films by using different alcohol solvents. J. Alloys Compd. 611, 297 (2014).Google Scholar
15.Shimanovich, K., Bouhadana, Y., Keller, D.A., Rühle, S., Anderson, A.Y., and Zaban, A.: Four-point probe electrical resistivity scanning system for large area conductivity and activation energy mapping. Rev. Sci. Instrum. 85, 055103 (2014).Google Scholar
16.Anderson, A.Y., Bouhadana, Y., Barad, H.-N., Kupfer, B., Rosh-Hodesh, E., Aviv, H., Tischler, Y.R., Rühle, S., and Zaban, A.: Quantum efficiency and bandgap analysis for combinatorial photovoltaics: sorting activity of Cu–O compounds in all-oxide device libraries. ACS Comb. Sci. 16, 53 (2014).Google Scholar
17.Keller, D.A., Ginsburg, A., Barad, H.-N., Shimanovich, K., Bouhadana, Y., Rosh-Hodesh, E., Takeuchi, I., Aviv, H., Tischler, Y.R., Anderson, A.Y., and Zaban, A.: Utilizing pulsed laser deposition lateral inhomogeneity as a tool in combinatorial material science. ACS Comb. Sci. 17, 209 (2015).Google Scholar
18.Keller, D.A., Barad, H.-N., Rietwyk, K.J., Ginsburg, A., Borvick, E., Priel, M., Anderson, A.Y., Meir, S., and Zaban, A.: Oxygen concentration as a combinatorial parameter: the effect of continuous oxygen vacancy variation on SnO2 layer conductivity. Mater. Chem. Phys. 208, 289 (2018).Google Scholar
19.Fukano, T. and Motohiro, T.: Low-temperature growth of highly crystallized transparent conductive fluorine-doped tin oxide films by intermittent spray pyrolysis deposition. Sol. Energy Mater. Sol. Cells 82, 567 (2004).Google Scholar
20.Raoufi, D., Kiasatpour, A., Fallah, H.R., and Rozatian, A.S.H.: Surface characterization and microstructure of ITO thin films at different annealing temperatures. Appl. Surf. Sci. 253, 9085 (2007).Google Scholar