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Low-temperature electrical conduction of plasma-treated bilayer MoS2

Published online by Cambridge University Press:  23 April 2018

Jakub Jadwiszczak Open the ORCID record for Jakub Jadwiszczak [Opens in a new window] ,
Yangbo Zhou  and
Hongzhou Zhang
Jakub Jadwiszczak
Affiliation:
School of Physics, Trinity College Dublin, Dublin 2, Ireland Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland Advanced Materials and BioEngineering Research Centre (AMBER), Trinity College Dublin, Dublin 2, Ireland School of Material Science and Engineering, Nanchang University, 999 Xuefu Road, Nanchang, Jiangxi 330031, China
Yangbo Zhou
Affiliation:
School of Material Science and Engineering, Nanchang University, 999 Xuefu Road, Nanchang, Jiangxi 330031, China
Hongzhou Zhang*
Affiliation:
School of Physics, Trinity College Dublin, Dublin 2, Ireland Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland Advanced Materials and BioEngineering Research Centre (AMBER), Trinity College Dublin, Dublin 2, Ireland
*
Address all correspondence to Hongzhou Zhang at [email protected]
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Abstract

We report on the low-temperature electrical characterization of bilayer MoS2 treated with increasing dose of oxygen:argon (1:3) plasma. We characterize the effective Schottky barrier heights as a function of plasma exposure time and observe a significant barrier lowering, with no accompanying p-type conduction in the negative bias region. Furthermore, we observe a crossover in the temperature-dependent conduction regimes below 181 K due to the plasma exposure. The Efros–Shklovskii (ES) hopping regime is seen to transform upon plasma exposure to a mixed ES/thermally-activated regime at high temperatures, and to a strongly short-range Arrhenius regime at low temperatures. We attribute the observed crossovers to a critical defect density created by the surface reaction with the plasma.

Type
Research Letters
Information
MRS Communications , Volume 8 , Issue 2 , June 2018 , pp. 514 - 520
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Copyright
Copyright © Materials Research Society 2018 

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