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Mutually reactive elements in a glass host matrix: Ag and S ion implantation in silica

Published online by Cambridge University Press:  31 January 2011

R. Bertoncello ,
S. Gross ,
F. Trivillin ,
E. Cattaruzza ,
G. Mattei ,
F. Caccavale ,
P. Mazzoldi ,
G. Battaglin  and
S. Daolio
R. Bertoncello
Affiliation:
I.N.S.T.M. and Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, via Loredan 4, 35131-Padova, Italy
S. Gross
Affiliation:
I.N.S.T.M. and Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, via Loredan 4, 35131-Padova, Italy
F. Trivillin
Affiliation:
I.N.S.T.M. and Dipartimento di Chimica Inorganica, Metallorganica ed Analitica, Università di Padova, via Loredan 4, 35131-Padova, Italy
E. Cattaruzza*
Affiliation:
Istituto Nazionale per la Fisica della Materia (I.N.F.M.) and Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131-Padova, Italy
G. Mattei
Affiliation:
Istituto Nazionale per la Fisica della Materia (I.N.F.M.) and Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131-Padova, Italy
F. Caccavale
Affiliation:
Istituto Nazionale per la Fisica della Materia (I.N.F.M.) and Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131-Padova, Italy
P. Mazzoldi
Affiliation:
Istituto Nazionale per la Fisica della Materia (I.N.F.M.) and Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131-Padova, Italy
G. Battaglin
Affiliation:
Istituto Nazionale per la Fisica della Materia (I.N.F.M.) and Dipartimento di Chimica Fisica, Università di Venezia, Dorsoduro 2137, 30123-Venezia, Italy
S. Daolio
Affiliation:
Istituto di Polarografia ed Elettrochimica Preparativa-C.N.R., c.so Stati Uniti 4, 35127-Padova, Italy
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Ag, S, Ag + S, and S + Ag single and double ion implantations in silica glass were performed at room temperature. The implantation energies were chosen in order to get a projected range of 40 nm. The fluences were 2 × 1016 S+ cm−2 and 5 × 1016 Ag+ cm−2. Silver interacts weakly with the host silica matrix and forms essentially metallic clusters; this weak interaction between Ag and SiO2 induces formation of silver silicate rather than silver oxide. Double ion implantations of silver and sulfur lead to chemical interaction between the two species that is critically influenced by the implantation sequence. In particular, in the Ag + S sample silver and sulfur atoms react to form crystalline core (Ag)–shell (Ag2S) nanoclusters.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 6 , June 1999 , pp. 2449 - 2457
Copyright
Copyright © Materials Research Society 1999

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