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Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers

Published online by Cambridge University Press:  31 January 2011

T. P. Niesen ,
M. R. De Guire ,
J. Bill ,
F. Aldinger ,
M. Rühle ,
A. Fischer ,
F. C. Jentoft  and
R. Schlögl
T. P. Niesen*
Affiliation:
Max-Planck-Institut für Metallforschung and Institut für Nichtmetallische Anorganische Materialien, Universität Stuttgart, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
M. R. De Guire
Affiliation:
Max-Planck-Institut für Metallforschung and Institut für Nichtmetallische Anorganische Materialien, Universität Stuttgart, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
J. Bill
Affiliation:
Max-Planck-Institut für Metallforschung and Institut für Nichtmetallische Anorganische Materialien, Universität Stuttgart, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
F. Aldinger
Affiliation:
Max-Planck-Institut für Metallforschung and Institut für Nichtmetallische Anorganische Materialien, Universität Stuttgart, Pulvermetallurgisches Laboratorium, Heisenbergstraβe 5, 70569 Stuttgart, Germany
M. Rühle
Affiliation:
Max-Planck-Institut für Metallforschung, Seestraβe 92, 70174 Stuttgart, Germany
A. Fischer
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4-6, 14195 Berlin, Germany
F. C. Jentoft
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4-6, 14195 Berlin, Germany
R. Schlögl
Affiliation:
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Abteilung Anorganische Chemie, Faradayweg 4-6, 14195 Berlin, Germany
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 6 , June 1999 , pp. 2464 - 2475
Copyright
Copyright © Materials Research Society 1999

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