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Ultrathin TiB2 protective films

Published online by Cambridge University Press:  31 January 2011

Feng Huang ,
John A. Barnard  and
Mark L. Weaver
Feng Huang
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35478-0202
John A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35478-0202
Mark L. Weaver
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, Alabama 35478-0202
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Abstract

TiB2 thin films demonstrate considerable potential for use as protective overcoats in the magnetic recording industry due to their excellent mechanical and tribological properties and good chemical and thermal stability. In the many studies performed on TiB2 films, the relative effectiveness of ultrathin TiB2 films has not been systematically investigated for very thin TiB2 films. In the present investigation, film stress and microstructure in as-sputtered and annealed ultrathin TiB2 films were investigated as a function of thickness. Ultrathin TiB2 films, as thin as 5 nm, were observed to adequately protect an underlying magnetic layer from oxidation up to 400 °C.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 4 , April 2001 , pp. 945 - 954
Copyright
Copyright © Materials Research Society 2001

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