Hostname: page-component-cd9895bd7-fscjk Total loading time: 0 Render date: 2024-12-23T12:50:46.508Z Has data issue: false hasContentIssue false
  • English
  • Français

Chemical sensors based on dielectric response of functionalized mesoporous silica films

Published online by Cambridge University Press:  31 January 2011

Karel Domansky ,
Jun Liu ,
Li-Qiong Wang ,
Mark H. Engelhard  and
Suresh Baskaran
Karel Domansky
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Jun Liu
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Li-Qiong Wang
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Mark H. Engelhard
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Suresh Baskaran*
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
*
b)Address all correspondence to this author.[email protected]
Get access

Abstract

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 10 , October 2001 , pp. 2810 - 2816
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Kresge, C.T., Leonowicz, M.E., Roth, W.J., Vartuli, J.C., and Beck, J.S., Nature 359, 710 (1992).Google Scholar
2Beck, J.S., Vartuli, J.C., Roth, W.J., Leonowicz, M.E., Kresge, C.T., Schmidt, K.D., Chu, C.T-W., Olson, D.H., Sheppard, E.W., McCullen, S.B., Higgins, J.B., and Schlenker, J.L., J. Am. Chem. Soc. 114, 10834 (1992).Google Scholar
3Olson, D.H., Stucky, G.D., and Vartuli, J.C., U.S. Patent No. 5 364 797 (November 15, 1994).Google Scholar
4Cernosek, R.W., Bigbie, J.R., Anderson, M.T., Small, J.H., and Sawyer, P.S., Technical Digest of the 1998 Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC (1998), pp. 375–378.Google Scholar
5Li, G-J. and Kawi, S., Talanta 45, 759 (1998).CrossRefGoogle Scholar
6Lu, Y., Han, L., Brinker, C.J., Niemczyk, T.M., and Lopez, G.P., Sens. Actuators B 36, 517 (1996).Google Scholar
7Gimon-Kinsel, M.E., and Balkus, K.J. Jr., Stud. Surf. Sci. Catal. 117, 111 (1998).Google Scholar
8Bruinsma, P.J., Bontha, J.R., Liu, J., and Baskaran, S., in Low Di-electric Constant Materials II, edited by Lagendijk, A., Treichel, H., Uram, K.J., and Jones, A.C. (Mater. Res. Symp. Proc. 443, Pitts-burgh, PA 1997), pp. 105–110.Google Scholar
9Baskaran, S., Liu, J., Domansky, K., Kohler, N., Li, X., Coyle, C., Fryxell, G.E., Thevuthasan, S., and Williford, R.E., Adv. Mater. 12, 291 (2000).Google Scholar
10Zhao, D., Yang, P., Melosh, N., Feng, J., Chmelka, B.F., and Stucky, G.D., Adv. Mater. 10, 1380 (1998).Google Scholar
11Vansant, E.F., Van der Voort, P., and Vrancken, K.C., in Charac-terization and Chemical Modification of the Silica Surface, (Elsevier, New York 1995), Vol, 93, 83–84.Google Scholar
12Jin, C., Luttmer, J.D., Smith, D.M., and Ramos, T.A., MRS Bulletin, 22, 39 (1997).Google Scholar
13Cho, C., Gnade, B.E., and Smith, D.M., U.S. Patent No. 5 504 042 (April 2, 1996).Google Scholar
14Domansky, K., Baldwin, D.L., Grate, J.W., Hall, T.B., Josowicz, M., and Janata, J., Anal. Chem. 70, 473 (1998).Google Scholar
15Goetzberger, A., Bell Syst. Tech. J. 45, 1097 (1966).Google Scholar
16Kang, U. and Wise, K.D., Technical Digest of the 1998 Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC (1998), pp. 183–186.Google Scholar
17Hair, M.L., in Infrared Spectroscopy in Surface Chemistry, (Mar-cel Dekker, New York, 1967), pp. 102–103.Google Scholar
18Cant, N.W. and Little, L.H., Can. J. Chem., 43, 1252 (1965).Google Scholar
19Chapman, I.D. and Hair, M.L., Trans. Faraday Soc. 61, 1507 (1965).CrossRefGoogle Scholar
20Peri, J.B., J. Phys. Chem. 70, 2937 (1966).Google Scholar