Skip to main content Accessibility help
×
Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-29T08:06:49.154Z Has data issue: false hasContentIssue false

2 - Phenomenology of deep levels

Published online by Cambridge University Press:  05 October 2010

E. F. Schubert
Affiliation:
AT&T Bell Laboratories, New Jersey
Get access

Summary

Deep levels are states within the forbidden gap of a semiconductor that are far removed from either conduction or valence band. Many of the deep levels are closer to the center of the gap than to either of the band edges. The name midgap center is frequently used for such deep levels. Due to their ability to capture free electrons and holes, deep levels are also called traps or deep traps. Deep levels caused by substitutional, non-hydrogenic impurities are referred to as deep impurities. Chromium in GaAs and Fe in InP are examples of such deep impurities. Finally, deep levels can be due to point defect centers. Examples of such deep centers are anti-site defects and interstitials.

Deep levels can be caused not only by point defects but also by spatially extended defects. Examples for extended defects are dislocations such as threading dislocations, misfit dislocations, or screw dislocations. Another example of extended ‘defects’ are semiconductor surfaces. Electronic states at semiconductor surfaces are called surface states or Bardeen states after Bardeen (1947) who demonstrated the influence of such states on the surface potential. In many semiconductors, Bardeen states are located in the vicinity of the center of the gap (e.g. GaAs and InP) and have properties similar to deep levels occurring in the bulk.

Deep centers can be classified according to their charge state. Centers with a neutral and positively charged state are called donor-like states.

Type
Chapter
Information
Publisher: Cambridge University Press
Print publication year: 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Save book to Kindle

To save this book to your Kindle, first ensure [email protected] is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

  • Phenomenology of deep levels
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.005
Available formats
×

Save book to Dropbox

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Dropbox.

  • Phenomenology of deep levels
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.005
Available formats
×

Save book to Google Drive

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Google Drive.

  • Phenomenology of deep levels
  • E. F. Schubert, AT&T Bell Laboratories, New Jersey
  • Book: Doping in III-V Semiconductors
  • Online publication: 05 October 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511599828.005
Available formats
×