The dynamics of moving solids with unilateral contacts are often modelled by assuming rigidity, point contacts, and Coulomb friction. The canonical example of a rigid rod with one endpoint slipping in two dimensions along a fixed surface (sometimes referred to as Painlevé rod) has been investigated thoroughly by many authors. The generic transitions of that system include three classical transitions (slip-stick, slip reversal, and liftoff) as well as a singularity called dynamic jamming, i.e., convergence to a codimension 2 manifold in state space, where rigid body theory breaks down. The goal of this paper is to identify similar singularities arising in systems with multiple point contacts, and in a broader setting to make initial steps towards a comprehensive list of generic transitions from slip motion to other types of dynamics. We show that – in addition to the classical transitions – dynamic jamming remains a generic phenomenon. We also find new forms of singularity and solution indeterminacy, as well as generic routes from sliding to self-excited microscopic or macroscopic oscillations.

In this paper, the mechanisms of material removal in chemical mechanical polishing (CMP) processes are investigated in detail by the smoothed particle hydrodynamics (SPH) method. The feature-scale behaviours of slurry flow, rough pad, wafer defects, moving solid boundaries, slurry-abrasive interactions, and abrasive collisions are modelled and simulated. Compared with previous work on CMP simulations, our simulations incorporate more realistic physical aspects of the CMP process, especially the effect of abrasive concentration in the slurry flows. The preliminary results on slurry flow in CMP provide microscopic insights on the experimental data of the relation between the removal rate and abrasive concentration and demonstrate that SPH is a suitable method for the research of CMP processes.