The use of a self-processing dry photopolymer layer capable of memorizing optical information as a local change in thickness, is proposed for the fabrication ofmicrolenses, binary holograms and gratings. Relief micro-optical elements aregenerated by direct imagewise exposure through a mask. A gradient of chemicalcomposition and a gradient of surface free energy cause the transfer of reactivespecies between dark and illuminated areas. Contrary to conventional lithographictechniques that require wet chemical post-treatment to remove parts of the photoresistmaterial, the fully self-processing character of this technique makes the recordavailable in situ and immediately after exposure.