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Tuning growth from clusters to continuousultrathin films: Experiments and molecular dynamics simulationsof Pd plasma sputter deposition

Published online by Cambridge University Press:  24 July 2002

P. Brault ,
A.-L. Thomann ,
C. Andreazza-Vignolle  and
P. Andreazza
P. Brault*
Affiliation:
Groupe de Recherches sur l'Énergétique des Milieux Ionisés, (UMR 6606 CNRS) Université d'Orléans, BP 6744, 45067 Orléans Cedex 2, France
A.-L. Thomann
Affiliation:
Groupe de Recherches sur l'Énergétique des Milieux Ionisés, (UMR 6606 CNRS) Université d'Orléans, BP 6744, 45067 Orléans Cedex 2, France
C. Andreazza-Vignolle
Affiliation:
Centre de Recherche sur la Matière Divisée, (UMR 6619 CNRS) Université d'Orléans, 45071 Orléans Cedex 2, France
P. Andreazza
Affiliation:
Centre de Recherche sur la Matière Divisée, (UMR 6619 CNRS) Université d'Orléans, 45071 Orléans Cedex 2, France
*
[email protected]
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Abstract

Plasma sputter deposition experiments and simple molecular dynamics calculations are performed for highlighting the effects of plasma ions and kinetic energy of palladium atoms on the morphology of thin films. A transition between cluster and continuous film growth is observed. It is attributed to the kinetic energy of the depositing sputtered palladium atoms and to high binding energy trapping sites resulting from the effects of ions incident on the surface during deposition. These high binding energy trapping sites act as additional nucleation centres that are allowed to be visited by the diffusing Pd atoms.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 19 , Issue 2 , August 2002 , pp. 83 - 87
Copyright
© EDP Sciences, 2002

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