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Study on preferred crystal orientations of Mg-Zr-O composite protective layer in AC-PDP

Published online by Cambridge University Press:  11 October 2006

G. Bingang ,
L. Chunliang ,
S. Zhongxiao ,
L. Liu ,
F. Yufeng ,
X. Xing  and
F. Duowang
G. Bingang*
Affiliation:
Advanced Display Research Center, Institute of Industrial Science, The University of Tokyo, Japan
L. Chunliang
Affiliation:
Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
S. Zhongxiao
Affiliation:
Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
L. Liu
Affiliation:
Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
F. Yufeng
Affiliation:
Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
X. Xing
Affiliation:
Key laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, P.R. China
F. Duowang
Affiliation:
Key laboratory of Opto-Electronic Technology and Intelligent Control of Ministry of Education, Lanzhou Jiaotong University, P.R. China
*
[email protected]
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Abstract

In order to study the preferred crystal orientations of Mg-Zr-O composite protective layers in PDP, Mg-Zr-O composite protective layers were deposited by Electron-beam Evaporator using (MgO+ZrO2) powder mixture as evaporation source material. X-ray diffractometer (XRD) was used to determine preferred crystal orientations of Mg-Zr-O composite protective layers, surface morphologies of films were analyzed by FESEM and voltage characteristics were examined in a testing macroscopic discharge cell of AC-PDP. On the basis of experimental analysis, the influence of oxide addition and deposition conditions on preferred orientations of Mg-Zr-O composite protective layers were investigated. The results showed that the preferred orientations of Mg-Zr-O films were determined by lattice distortion of MgO crystal. The deposition conditions have great effects on the preferred orientations of Mg-Zr-O films. The preferred orientations affect voltage characteristics through affecting surface morphology of Mg-Zr-O films. A small amount of Zr solution in MgO can decrease firing voltage compared with using pure MgO film. Firing voltage is closely related with the [ ZrO2/(MgO+ZrO2)]ratio of evaporation source materials.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 36 , Issue 2 , November 2006 , pp. 111 - 117
Copyright
© EDP Sciences, 2006

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References

Kunio Yoshida, Heiju Uchiike, Masahiro Sawa, IEICE T. Electron. E82-C, 1798 (1999)
Eun-Ha Choi, Hyun-Joo Oh, Young-Guon Kim, et al., Jpn J. Appl. Phys. 37, 7015 (1998) CrossRef
M. Ishimoto, S. Hidaka, K. Betsui, T. Shinoda, Secondary Electron Emission Analysis of MgO Films in ac Plasma Displays, SID99 P-25, 552 (1999)
Eun-Ha Choi, Jae-Yong Lim, Young-Guon Kim, , et al., J. Appl. Phys. 86, 6525 (1999)
Dae-I Kim, Jae-Yong Lim, Young-Guon Kim, , et al., Jpn J. Appl. Phys. 39, 1890 (2000)
van Elsbergen, V., Bachmann, P.K., Zhong, G., IDW00 PDP5-3, 687 (2000)
Jinhui Cho, Rakhwan Kim, Kyoung-Woo, Lee, et al., Thin Solid Films 350, 173 (1999)
Rakhwan Kim, Younghyun Kim, Jong-Wan Park, , Thin Solid Films 376, 183 (2000) CrossRef
Rakhwan Kim, Younghyun Kim, Yong-Uk, Lee, et al., Surf. Coat. Tech. 161, 52 (2002)
Rakhwan Kim, Younghyun Kim, Jong-Wan Park, , Vacuum 61, 37 (2001)
Rakhwan Kim, Younghyun Kim, Jong-Wan Park, , Mat. Sci. Eng. B 83, 55 (2001)
Tcheliebou, F., Boyer, A., Martin, L., Thin Solid Films 249, 86 (1994) CrossRef
Hagelaar, G.J.M., Klein, M.H., Snijkers, R.J.M., Kroesen, G.M.W., J. Appl. Phys. 89, 2033 (2001) CrossRef
Hagstrum, H.D., Phys. Rev. 96, 325 (1954) CrossRef
Hagstrum, H.D., Phys. Rev. 104, 672 (1956) CrossRef