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Production of gold tips for tip-enhanced near-field optical microscopy and spectroscopy: analysis of the etching parameters

Published online by Cambridge University Press:  18 August 2005

L. Billot
Affiliation:
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671, Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
L. Berguiga
Affiliation:
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671, Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
M. L. de la Chapelle*
Affiliation:
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671, Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
Y. Gilbert
Affiliation:
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671, Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
R. Bachelot
Affiliation:
Laboratoire de nanotechnologie et d'instrumentation optique, CNRS FRE 2671, Université de Technologie de Troyes, 12 rue Marie Curie, BP 2060, 10010 Troyes, France
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Abstract

In this paper, we analyze in detail the etching parameters that are used for manufacturing gold tips for tip-enhanced near-field optical microscopy and spectroscopy. From the current variation versus time, we first demonstrate that the sharpest tips are obtained if the etching is stopped at a specific time where the curve presents an inflexion point. We then analyze the influence of the concentration of the etching solution and the applied voltage on the roughness and the tip apex. As a result, we propose a set of parameters allowing for reproducible production of gold tips with 20 nm radius of curvature.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2005

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