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Plasma deposition of antimicrobial coating on organic polymer *

Published online by Cambridge University Press:  15 February 2013

Zenobia Rżanek-Boroch ,
Paulina Dziadczyk ,
Danuta Czajkowska ,
Krzysztof Krawczyk  and
Wojciech Fabianowski
Zenobia Rżanek-Boroch*
Affiliation:
Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Paulina Dziadczyk
Affiliation:
Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Danuta Czajkowska
Affiliation:
Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Krzysztof Krawczyk
Affiliation:
Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
Wojciech Fabianowski
Affiliation:
Warsaw University of Technology, Noakowskiego 3, 00-664 Warszawa, Poland
*
ae-mail: [email protected]
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Abstract

Organic materials used for packing food products prevent the access of microorganisms or gases, like oxygen or water vapor. To prolong the stability of products, preservatives such as sulfur dioxide, sulfites, benzoates, nitrites and many other chemical compounds are used. To eliminate or limit the amount of preservatives added to food, so-called active packaging is sought for, which would limit the development of microorganisms. Such packaging can be achieved, among others, by plasma modification of a material to deposit on its surface substances inhibiting the growth of bacteria. In this work plasma modification was carried out in barrier discharge under atmospheric pressure. Sulfur dioxide or/and sodium oxide were used as the coating precursors. As a result of bacteriological studies it was found that sulfur containing coatings show a 16% inhibition of Salmonella bacteria growth and 8% inhibition of Staphylococcus aureus bacteria growth. Sodium containing coatings show worse (by 10%) inhibiting properties. Moreover, films with plasma deposited coatings show good sealing properties against water vapor.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 61 , Issue 2: Topical issue: 13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII). Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui , February 2013 , 24316
Copyright
© EDP Sciences, 2013

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Footnotes

*

Contribution to the Topical Issue “13th International Symposium on High Pressure Low Temperature Plasma Chemistry (Hakone XIII)”, Edited by Nicolas Gherardi, Henryca Danuta Stryczewska and Yvan Ségui.

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